The effect of sub-ns duration and sub-mJ energy laser pulse on 13.5 nm extreme ultraviolet (EUV) source diameter and conversion efficiency has been investigated. It was demonstrated that an in-band EUV source diameter as low as 18 μm has been produced due to short scale length of the picoseconds duration laser plasma. Such EUV source is suitable for high brightness and high repetition rate metrology applications.
We evaluate the EUV emission and the spatial distributions of the plasma parameters by use of the two-dimensional (2-D) radiation hydrodynamic simulation in the microplasma high-brightness EUV source. The expected EUV source size, which is attributed to the expanding microplasma by the hydrodynamic motion, was evaluated to be 15 μm at the laser pulse duration of 150 ps [full width at half-maximum (FWHM)]. The numerical simulation suggests that the high brightness EUV source should be produced by use of a dot target based microplasma with the source diameter less than 20 μm. The emission at 13.5 nm was attributed to Sn charge states between Sn7+ and Sn12+ with the UTA spectral structure.
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