Dr. Grzegorz Gwalt Profile

Dr. Grzegorz Gwalt

at Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

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Publications (4)

Proceedings Article | 9 June 2023 Presentation

On the current state of reflective and diffractive X-ray optical elements and their characterization by means of ex-situ and at-wave-length metrology (Conference Presentation)

Frank Siewert, Jana Buchheim, Grzegorz Gwalt, Analia Fernandez Herrero, Stephanie Lemke, Svyatoslav Alimov, Jeniffa Knedel, Tino Seliger, Thomas Zeschke, Stefan Rehbein, Andrey Sokolov

Proceedings Volume PC12581, PC1258109 (2023) https://doi.org/10.1117/12.2666473

KEYWORDS: Optical components, Metrology, X-rays, X-ray optics, X-ray diffraction, X-ray characterization, Reflectivity, Manufacturing, Mirrors, Free electron lasers

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Proceedings Article | 27 April 2023 Presentation + Paper

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963

KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

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Proceedings Article | 22 February 2021 Presentation

GIXRF and machine learning as metrological tools for shape and element sensitive reconstructions of periodic nanostructures

Anna Andrle, Philipp Hönicke, Grzegorz Gwalt, Philipp-Immanuel Schneider, Yves Kayser, Frank Siewert, Victor Soltwisch

Proceedings Volume 11611, 116110R (2021) https://doi.org/10.1117/12.2586082

KEYWORDS: Nanostructures, Metrology, Machine learning, X-rays, X-ray optics, X-ray fluorescence spectroscopy, Statistical analysis, Semiconducting wafers, Reflectivity, Nondestructive evaluation

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Proceedings Article | 9 September 2019 Presentation + Paper

On the characterization of ultra-precise XUV-focusing mirrors by means of slope- measuring deflectometry

Frank Siewert, Jana Buchheim, Grzegorz Gwalt, Jens Viefhaus

Proceedings Volume 11109, 111090N (2019) https://doi.org/10.1117/12.2529308

KEYWORDS: Mirrors, Deflectometry, Synchrotrons, Ion beams, Ion beam finishing, Nano opto mechanical systems, Spatial resolution, Photons, Optics manufacturing, Ray tracing

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