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Guanghua Yang
at Beijing Institute of Technology
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Publications (1)
Proceedings Article | 23 March 2012 Paper
Analysis and control of thermal and structural deformation of projection optics for 22-nm EUV lithography
Proceedings Volume 8322, 83222V (2012) https://doi.org/10.1117/12.916275
KEYWORDS: Mirrors, Extreme ultraviolet lithography, Semiconducting wafers, Projection systems, Mirror structures, EUV optics, Spherical lenses, Extreme ultraviolet, Thermography, Finite element methods
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