The theory of partial coherence has important applications in many fields such as optical system imaging, optical projection lithography, optical communication and speckle metrology. A tiny pinhole is essential to calibrate the wavefront error of the collimating lens when testing the wavefront error of the projection optics by using the method of Shack-Hartmann wavefront sensor. In this paper, a formulation is developed for investigating the intensity distribution in the far field diffracted by a circular tiny pinhole illuminated with partially coherent light. Assuming that aperture complex coherence is Bessel's correlation, the diffraction field far away from the pinhole is numerical calculated. The actual distribution of the field diffracted by the tiny pinhole is influenced by both the pinhole diameter and the coherence of light inside the pinhole aperture.
Compared with other non-contact displacement sensors, the chromatic confocal sensor, which based on wavelengthdisplacement modulation technique, has no special requirements on the material and texture of the measured surface, and suitable for measuring the displacement of objects whose size range from micro to macro with high precision. In this paper, the chromatic confocal method is applied to measure the micro displacement. A hyperchromats with a measurement range of 1.27mm and linear regression coefficient R2 of 0.996 has been designed by using ZEMAX optical design software. The experimental system of chromatic confocal displacement measurement is set up. Through two miniature fiber optic spectrometers, the large measurement range and high precision spectrum detection are realized. The system error is calibrated synthetically. The measurement range of 1.2mm and linear regression coefficient R2 of 0.997 is realized. The research results are of great significance for the development of micro-nanometer displacement measurement technology.
In an aberration measurement for the lithographic projection lens based on the lateral shear interferometry, stage needs move tens of nanometers to do phase motion, and move tens of millimeters to shift field points. But the stage met the both requirements is very expensive. Usually using a fine stage fold on a coarse stage to meet the both requirements. Whereas this method has a difficult to overcome since the both stages hardly keep the same motion direction. This article proposes a method to measure the angle between the stages motion direction based on the dual-frequency laser interferometer by respectively moving the both stages and flowing the 45 degrees. The measurement accuracy able reach the 0.10 mrad and meet the aberration measurement requirement.
For the rapid development need of the digital light processing (DLP), we designed a mini-projection lens applied to 0.65” DLP with ZEMAX. The mini-projection lens is composed of 9 group of 10 lenses, total length is 90mm, and the maximum aperture is 36mm. It has simple structure, small size, low processing and assembly costs, suitable for mass production. F-number is 2.4, projection ratio is 1.56, effective focal length is 22.67mm, and back working distance is 28mm. Its modulated transfer function (MTF) in all fields is higher than 0.75 at 66lp/mm, and higher than 0.6 at 100lp/mm, which has good image quality. The full field distortion is less than 0.2%, meeting the low distortion requirement of the projection lens.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.