Dr. Haruhiko Kusunose
Managing Director at Lasertec Corp
SPIE Involvement:
Author
Publications (25)

Proceedings Article | 9 April 2020 Paper
Proceedings Volume 11323, 113231K (2020) https://doi.org/10.1117/12.2557858
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

Proceedings Article | 25 November 2019 Open Access Paper
Proceedings Volume 11148, 111480W (2019) https://doi.org/10.1117/12.2538001
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

Proceedings Article | 13 July 2017 Paper
Shinobu Ohara, Akinori Yoshida, Mitsuo Hirai, Takenori Kato, Koichi Moriizumi, Haruhiko Kusunose
Proceedings Volume 10454, 1045402 (2017) https://doi.org/10.1117/12.2284332
KEYWORDS: Inspection, Photomasks, Light scattering, Organic light emitting diodes, Digital image correlation, Manufacturing, Laser development, Optics manufacturing, LCDs, Particles

Proceedings Article | 18 March 2016 Paper
Proceedings Volume 9776, 97761G (2016) https://doi.org/10.1117/12.2222747
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 96580O (2015) https://doi.org/10.1117/12.2197309
KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 28 July 2014 Paper
Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose
Proceedings Volume 9256, 92560P (2014) https://doi.org/10.1117/12.2067566
KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560O (2014) https://doi.org/10.1117/12.2069197
KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Image classification, Mirrors, Geometrical optics, Ray tracing, Lithography, Manufacturing

Proceedings Article | 28 June 2013 Paper
Proceedings Volume 8701, 870118 (2013) https://doi.org/10.1117/12.2030712
KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790I (2013) https://doi.org/10.1117/12.2011776
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Prototyping, Extreme ultraviolet lithography, Defect detection, High volume manufacturing, Metrology, Mirrors

Proceedings Article | 30 June 2012 Paper
Proceedings Volume 8441, 844115 (2012) https://doi.org/10.1117/12.964983
KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Switches, EUV optics, Photomasks, Charge-coupled devices, Cameras, Extreme ultraviolet lithography, Electroluminescent displays

Proceedings Article | 11 May 2009 Paper
Hiroto Nozawa, Takayuki Ishida, Satoru Kato, Osamu Sato, Koji Miyazaki, Kiwamu Takehisa, Naoki Awamura, Hideo Takizawa, Hal Kusunose
Proceedings Volume 7379, 737925 (2009) https://doi.org/10.1117/12.824318
KEYWORDS: Phase measurement, Transmittance, Photomasks, Signal detection, Lithography, Distance measurement, Interferometers, Image processing, Charge-coupled devices, Objectives

Proceedings Article | 11 May 2009 Paper
Andy Ma, Ted Liang, Seh-Jin Park, Guojing Zhang, Tomoya Tamura, Kazunori Omata, Yuta Sato, Hal Kusunose
Proceedings Volume 7379, 73790I (2009) https://doi.org/10.1117/12.824259
KEYWORDS: Inspection, Quartz, Silica, Photomasks, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Defect detection, Surface roughness, Defect inspection

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67305I (2007) https://doi.org/10.1117/12.746537
KEYWORDS: Laser irradiation, Excimer lasers, Extreme ultraviolet, Quartz, Pulsed laser operation, Optical simulations, Extreme ultraviolet lithography, EUV optics, Polishing, Surface finishing

Proceedings Article | 13 March 2007 Paper
Wonil Cho, Patrick Kearney, Eric Gullikson, Anwei Jia, Tomoya Tamura, Atsushi Tajima, Hal Kusunose, Chan-Uk Jeon
Proceedings Volume 6517, 65170D (2007) https://doi.org/10.1117/12.712990
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect detection, Extreme ultraviolet, Reflectivity, Multilayers, Defect inspection, Atomic force microscopy, Optical spheres

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600209
KEYWORDS: Optical spheres, Multilayers, Confocal microscopy, Photomasks, Microscopes, Silica, Defect inspection, Light scattering, Inspection, Scattering

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518033
KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

Proceedings Article | 24 July 1996 Paper
Hiroshi Fujita, Hisatake Sano, Haruhiko Kusunose, Hideo Takizawa, Kouji Miyazaki, Naoki Awamura, Takahiro Ode, Daikichi Awamura
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245227
KEYWORDS: Phase shifts, Phase measurement, Halftones, Sodium, Transmittance, Refractive index, Photomasks, Objectives, Quartz, Laser systems engineering

Proceedings Article | 24 July 1996 Paper
Haruhiko Kusunose, Naoki Awamura, Hideo Takizawa, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245242
KEYWORDS: Phase measurement, Interferometers, Deep ultraviolet, Quartz, Refractive index, Photomasks, Semiconducting wafers, Excimer lasers, Lamps, Etching

Proceedings Article | 24 July 1996 Paper
Hideo Takizawa, Haruhiko Kusunose, Naoki Awamura, Kouji Miyazaki, Takahiro Ode, Daikichi Awamura
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245226
KEYWORDS: Transmittance, Interferometers, Shearing interferometers, Microscopes, Virtual point source, Spectrophotometry, Optical testing, Photomasks, Mirrors, Particles

Proceedings Article | 3 November 1994 Paper
Haruhiko Kusunose, Hiroyuki Nakae, Junji Miyazaki, Nobuyuki Yoshioka, Hiroaki Morimoto, Keiichi Murayama, Katsuhiro Tsukamoto
Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191941
KEYWORDS: Phase shifts, Phase measurement, Photomasks, Semiconducting wafers, Quartz, Inspection, Shearing interferometers, Transmittance, Microscopes, Refractive index

Proceedings Article | 17 May 1994 Paper
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175405
KEYWORDS: Photomasks, Phase shifts, Lithography, Etching, Transmittance, Excimer lasers, Semiconducting wafers, Sputter deposition, Mask making, Molybdenum

Proceedings Article | 8 August 1993 Paper
Satoshi Aoyama, Haruhiko Kusunose, Minoru Hanazaki, Nobuyuki Yoshioka, Yaichiro Watakabe, Atsushi Hayashi, Akihiko Isao, Yasuo Tokoro
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150466
KEYWORDS: Etching, Magnetism, Chromium, Phase shifts, Protactinium, Photomasks, Optical lithography, Reactive ion etching, Critical dimension metrology, Plasma

Proceedings Article | 1 June 1992 Paper
Mitsunori Nakatani, Hirofumi Nakano, Haruhiko Kusunose, Kazuya Kamon, Shuichi Matsuda, Yaichiro Watakabe, Hirozo Takano, Mutuyuki Otsubo
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130350
KEYWORDS: Phase shifts, Image processing, Photoresist processing, Optical lithography, Image resolution, Gallium arsenide, Field effect transistors, Phase shifting, Semiconducting wafers, Optoelectronics

Proceedings Article | 1 June 1992 Paper
Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, Yaichiro Watakabe
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130323
KEYWORDS: Phase shifts, Chromium, Photomasks, Etching, Mask making, Ultraviolet radiation, Metals, Quartz, Inspection, Floods

Showing 5 of 25 publications
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