Haruyuki Nomura
at NuFlare Technology Inc
SPIE Involvement:
Author
Publications (13)

SPIE Journal Paper | 14 February 2024
Noriaki Nakayamada, Haruyuki Nomura, Yasuo Kato, Kenichi Yasui, Abhishek Shendre, Nagesh Shirali, Yukihiro Masuda, Aki Fujimura
JM3, Vol. 23, Issue 01, 011206, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011206
KEYWORDS: Design, Etching, Vestigial sideband modulation, Printing, Dose control, Raster graphics, Bias correction, Lithography, Electron beam lithography, Scanning electron microscopy

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994
KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

Proceedings Article | 30 April 2023 Presentation
Noriaki Nakayamada, Haruyuki Nomura, Ryosuke Ueba, Yasuo Kato, Kenichi Yasui
Proceedings Volume 12495, 1249507 (2023) https://doi.org/10.1117/12.2658633
KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Manufacturing, Electron beam lithography, Beam shaping

Proceedings Article | 11 November 2022 Presentation
Proceedings Volume PC12293, PC122930I (2022) https://doi.org/10.1117/12.2641449
KEYWORDS: Photomasks, Glasses, Semiconductors, Physical phenomena, Optical lithography, Mask making, Line edge roughness, Extreme ultraviolet lithography, Error analysis, Edge roughness

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 123250O (2022) https://doi.org/10.1117/12.2641338
KEYWORDS: Photomasks, Line edge roughness, Mask making, Metrology, Data conversion, Convolution, Data processing

Showing 5 of 13 publications
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