KEYWORDS: Light emitting diodes, Metalorganic chemical vapor deposition, Semiconducting wafers, Control systems, Ultraviolet radiation, Light sources and illumination, Interfaces, Manufacturing, Epitaxy, Process control
To enable LED technology we developed the MOCVD technology for III-As/P/N based structures in reactors ranging from small scale to large production scale Planetary Reactors. The closed coupled showerhead reactor series (CCS reactor) and the Planetary Reactor® developed in parallel and both gave production proven results. The focus of epitaxy production technology developments has been put on improved process control, productivity enhancements, in-situ metrology for smart system control and predictive maintenance. A comprehensive summary and recent progress will be reported here. The application of the underlying physical, technical and chemical fundamentals explain the engineering concept.
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