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Heidi Kwon
at Lam Research Corp
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Publications (1)
Proceedings Article | 20 March 2019 Presentation + Paper
Scanner and etch co-optimized corrections for better overlay and CD control
Ik-Hyun Jeong , Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Katja Viatkina, Tom van Hemert, Ruud de Wit, David Deckers, Owen Chen, Nang-Lyeom Oh, Marcus Musselman, Marcus Carbery, Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee
Proceedings Volume 10963, 1096308 (2019) https://doi.org/10.1117/12.2516578
KEYWORDS: Etching, Overlay metrology, Scanners, Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Plasma, Process control, Optical lithography
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