Dr. Helder Alves Profile

Dr. Helder Alves

at Vistec Electron Beam Lithography Group

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Author

Publications (5)

Proceedings Article | 3 April 2012 Paper

Investigations into an electrostatic chuck design for 450mm Si wafer

Gerhard Kalkowski, Thomas Peschel, Geoffrey Hassall, Helder Alves, Stefan Risse

Proceedings Volume 8324, 83242Z (2012) https://doi.org/10.1117/12.916380

KEYWORDS: Semiconducting wafers, Silicon, Silicon carbide, Electron beam lithography, Manufacturing, Kinematics, Etching, Plasma etching, Lithography, Glasses

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Proceedings Article | 3 April 2010 Paper

Monte Carlo modeling of BSE reflection in e-beam writers

H. Alves, K.-P. Johnsen, P. Hahmann, D. Gnieser, C. Frase, H. Bosse

Proceedings Volume 7637, 76371T (2010) https://doi.org/10.1117/12.846517

KEYWORDS: Reflection, Silicon, Teeth, Monte Carlo methods, Semiconducting wafers, Electron beams, Sensors, Objectives, Lithography, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

Optimization of BSE-detector for e-beam direct write lithography

H. Alves, P. Hahmann, M. Slodowski, C. Frase, D. Gnieser, Klaus-Peter Johnsen, H. Bosse

Proceedings Volume 7271, 72712O (2009) https://doi.org/10.1117/12.814156

KEYWORDS: Sensors, Signal to noise ratio, Monte Carlo methods, Signal detection, Lithography, Etching, Scattering, Electron beams, Direct write lithography, Vestigial sideband modulation

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Proceedings Article | 2 May 2008 Paper

New alignment marks for improved measurement maturity

U. Weidenmueller, H. Alves, B. Schnabel, B. Icard, L. Pain, J.-C. Le Denmat, S. Manakli, J. Pradelles

Proceedings Volume 6792, 679211 (2008) https://doi.org/10.1117/12.798788

KEYWORDS: Optical alignment, Semiconducting wafers, Optical lithography, Electron beams, Electron beam direct write lithography, Lithography, Signal to noise ratio, Overlay metrology, Signal detection, Wafer testing

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Proceedings Article | 26 March 2008 Paper

E-beam direct write alignment strategies for the next generation node

H. Alves, P. Hahmann, K.-H. Kliem, U. Weidenmueller, S. Jahr, C. Frase, D. Gnieser, H. Bosse, R. Zimmermann, C. Arndt

Proceedings Volume 6921, 69210I (2008) https://doi.org/10.1117/12.771585

KEYWORDS: Optical alignment, Monte Carlo methods, Sensors, Silicon, Signal to noise ratio, Signal detection, Semiconducting wafers, Vestigial sideband modulation, Electron beam direct write lithography, Lithography

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