Mr. Hiromasa Yamanashi Profile

Hiromasa Yamanashi

at ASET

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 20 October 2006 Paper

Current status of Mo-Si multilayer formation in ASET for low-defect-density mask blanks for EUV lithography

Kenji Hiruma, Yuusuke Tanaka, Shinji Miyagaki, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 6349, 634937 (2006) https://doi.org/10.1117/12.685819

KEYWORDS: Silicon, Molybdenum, Sputter deposition, Ion beams, Interfaces, Particles, Reflectivity, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2006 Paper

Performance and quality analysis of Mo-Si multilayers deposited by ion beam sputtering and magnetron sputtering

Kenji Hiruma, Shinji Miyagaki, Hiromasa Yamanashi, Yuusuke Tanaka, Jerry Cullins, Iwao Nishiyama

Proceedings Volume 6151, 61511V (2006) https://doi.org/10.1117/12.655563

KEYWORDS: Sputter deposition, Silicon, Molybdenum, Extreme ultraviolet, Interfaces, Ion beams, Reflectivity, Chemical species, Transmission electron microscopy, Argon

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Proceedings Article | 6 May 2005 Paper

Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer

H. Oizumi, H. Yamanashi, I. Nishiyama, K. Hashimoto, S. Ohsono, A. Masuda, A. Izumi, H. Matsumura

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601136

KEYWORDS: Carbon, Extreme ultraviolet, Hydrogen, Reflectivity, Contamination, Optical testing, Silicon, Thermal effects, Synchrotron radiation, Protactinium

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Proceedings Article | 20 August 2004 Paper

Investigation of several materials as buffer layer candidates of EUVL mask

Dongwan Kim, Yuusuke Tanaka, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557770

KEYWORDS: Etching, Ruthenium, Chromium, Extreme ultraviolet lithography, Multilayers, Reflectivity, Photomasks, Deep ultraviolet, Defect inspection, Silicon

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Proceedings Article | 20 August 2004 Paper

Visible-light inspection of EUVL multilayer mask blanks

Takeo Hashimoto, Hiromasa Yamanashi, Shinji Miyagaki, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557772

KEYWORDS: Inspection, Optical spheres, Photomasks, Silicon, Surface roughness, Extreme ultraviolet lithography, Particles, Photonics, Particle systems, Interference (communication)

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Proceedings Article | 20 August 2004 Paper

Study of mask process development for EUVL

Tsukasa Abe, Masaharu Nishiguchi, Tsuyoshi Amano, Toshiaki Motonaga, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Yuusuke Tanaka, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557817

KEYWORDS: Etching, Atomic force microscopy, Chromium, Dry etching, Photoresist processing, Extreme ultraviolet lithography, Plasma, Scanning electron microscopy, Photomasks, Diamond machining

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Proceedings Article | 20 May 2004 Paper

EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber

Yuusuke Tanaka, Dongwan Kim, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536042

KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Multilayers, Etching, Extreme ultraviolet lithography, Absorbance, Absorption, Line edge roughness, Chromium

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Proceedings Article | 20 May 2004 Paper

Lithographic characterization of EUVL mask blank defects

Takeo Hashimoto, Hiromasa Yamanashi, Minoru Sugawara, Iwao Nishiyama

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534692

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect detection, Lithography, Phase shifts, Molybdenum, Silicon, Sputter deposition, Electron beams

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Proceedings Article | 28 August 2003 Paper

Dependence of pattern printability on thicknesses of absorber and cap layers of Mo/Si mask blank for EUV lithography

Minoru Sugawara, Akira Chiba, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504376

KEYWORDS: Reflectivity, Silicon, Photomasks, Ruthenium, Nanoimprint lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Absorbance, Oxidation

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SPIE Journal Paper | 1 April 2003

Simulation model of in-plane distortion in extreme ultraviolet lithography mask during chucking without friction

Akira Chiba, Eiichi Hoshino, Minoru Sugawara, Hiromasa Yamanashi, Kazuya Ota, Taro Ogawa, Shinji Okazaki

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1563645

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Multilayers, Distortion, Mathematical modeling, Interfaces, Glasses, Tantalum, Error analysis, Quartz

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Proceedings Article | 1 August 2002 Paper

Pattern printability for reflectance degradation of Mo/Si mask blanks in EUV lithography

Minoru Sugawara, Masaaki Ito, Akira Chiba, Eiichi Hoshino, Hiromasa Yamanashi, Hiromasa Hoko, Taro Ogawa, Byoung Lee, Takashi Yoneda, Masashi Takahashi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476991

KEYWORDS: Reflectivity, Photomasks, Binary data, Molybdenum, Silicon, Extreme ultraviolet lithography, Phase shifts, Semiconducting wafers, Ruthenium, Mirrors

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Proceedings Article | 1 July 2002 Paper

Fabrication of Mo/Si multilayer for EUVL reticle blank using ion beam sputtering

Hiromasa Yamanashi, Taro Ogawa, Hiromasa Hoko, Byoung Lee, Eiichi Hoshino, Masashi Takahashi, Takashi Yoneda, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472345

KEYWORDS: Multilayers, Sputter deposition, Extreme ultraviolet lithography, Reflectivity, Ion beams, Extreme ultraviolet, Reticles, Photomasks, Silicon, Molybdenum

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Proceedings Article | 1 July 2002 Paper

Simulation studies of roughness-smoothing effect of molybdenum/silicon multilayer coating based on resputtering model

Taro Ogawa, Masaaki Ito, Hiromasa Yamanashi, Hiromasa Hoko, Eiichi Hoshino, Shinji Okazaki

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472346

KEYWORDS: Molybdenum, Multilayers, Silicon, Chemical species, Sputter deposition, Extreme ultraviolet lithography, Coating, Transmission electron microscopy, Argon, Photomasks

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Proceedings Article | 5 September 2001 Paper

Thermal response of EUVL mask substrate during dry etching process

Akira Chiba, Eiichi Hoshino, Makoto Takahashi, Hiromasa Yamanashi, Hiromasa Hoko, Byoung Lee, Takashi Yoneda, Masaaki Ito, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438369

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Dry etching, Silicon, Semiconducting wafers, Glasses, Temperature metrology, Quartz, Multilayers, Reflectivity

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Proceedings Article | 20 August 2001 Paper

Characteristics of the Ru buffer layer for EUVL mask patterning

Byoung Lee, Eiichi Hoshino, Masashi Takahashi, Takashi Yoneda, Hiromasa Yamanashi, Hiromasa Hoko, Akira Chiba, Masaaki Ito, Manhyoung Ryoo, Taro Ogawa, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436699

KEYWORDS: Ruthenium, Etching, Photomasks, Multilayers, Inspection, Optical lithography, Extreme ultraviolet lithography, Amorphous silicon, Reflectivity, Deep ultraviolet

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Proceedings Article | 20 August 2001 Paper

Tantalum nitride films for the absorber material of refractive-type EUVL mask

Masashi Takahashi, Taro Ogawa, Eiichi Hoshino, Hiromasa Hoko, Byoung Lee, Akira Chiba, Hiromasa Yamanashi, Shinji Okazaki

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436702

KEYWORDS: Tantalum, Deep ultraviolet, Reflectivity, Sputter deposition, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Multilayers, Silicon, Absorbance

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Proceedings Article | 9 April 2001 Paper

Removal process for buffer layer on multilayer of EUVL mask

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Byoung Lee, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425097

KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Manufacturing, Multilayers, Wet etching, Deep ultraviolet, Microscopes, Inspection, Reflectivity

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Proceedings Article | 22 January 2001 Paper

Dry etching of Ta absorber for EUVL masks

Eiichi Hoshino, Taro Ogawa, Naoya Hirano, Hiromasa Hoko, Masashi Takahashi, Hiromasa Yamanashi, Akira Chiba, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410755

KEYWORDS: Tantalum, Photomasks, Etching, Dry etching, Extreme ultraviolet lithography, Semiconducting wafers, Silicon, Chlorine, Glasses, Plasma etching

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Proceedings Article | 21 July 2000 Paper

Smooth low-stress sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Masashi Takahashi, Taro Ogawa, Hiromasa Hoko, Eiichi Hoshino, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390087

KEYWORDS: Tantalum, Sputter deposition, Photomasks, Extreme ultraviolet lithography, Reflectivity, Deep ultraviolet, Argon, Surface roughness, Inspection, Extreme ultraviolet

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Proceedings Article | 19 July 2000 Paper

Surface preparation of EUVL mask substrate for multilayer coating by supersonic hydrocleaning technique

Naoya Hirano, Hiromasa Hoko, Eiichi Hoshino, Taro Ogawa, Akira Chiba, Hiromasa Yamanashi, Masashi Takahashi, Shinji Okazaki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392046

KEYWORDS: Particles, Semiconducting wafers, Extreme ultraviolet lithography, Silicon, Photomasks, Ultraviolet radiation, Atmospheric particles, Pellicles, Natural surfaces, Coating

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Proceedings Article | 19 July 2000 Paper

Process scheme for removing buffer layer on multilayer for EUVL mask

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Akira Chiba, Masaaki Ito, Shinji Okazaki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392050

KEYWORDS: Etching, Tantalum, Dry etching, Extreme ultraviolet lithography, Wet etching, Photomasks, Multilayers, HF etching, Yield improvement, Silicon

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Proceedings Article | 30 December 1999 Paper

Damage control during dry etching of EUV mask: I. Control of surface roughness

Eiichi Hoshino, Taro Ogawa, Masashi Takahashi, Hiromasa Hoko, Hiromasa Yamanashi, Naoya Hirano, Shinji Okazaki

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373372

KEYWORDS: Etching, Tantalum, Dry etching, Photomasks, Surface roughness, Extreme ultraviolet, Silicon, Atomic force microscopy, Multilayers, Optical properties

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Proceedings Article | 5 June 1998 Paper

Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Platonov, Nicola Grupido

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

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Proceedings Article | 27 May 1996 Paper

Optical system for high-throughput EUV lithography

Souichi Katagiri, Masaaki Ito, Hiromasa Yamanashi, Eiichi Seya, Tsuneo Terasawa

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240487

KEYWORDS: Mirrors, Photomasks, Wafer-level optics, Optical design, Semiconducting wafers, Reflectivity, Polishing, Imaging systems, Extreme ultraviolet lithography, Lithographic illumination

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Proceedings Article | 3 July 1995 Paper

Reflection masks for soft x-ray projection lithography

Masaaki Ito, Takashi Soga, Hiromasa Yamanashi, Taro Ogawa

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212759

KEYWORDS: Reflectivity, Photomasks, Reflection, Reactive ion etching, X-rays, Projection lithography, X-ray lithography, Wafer-level optics, Etching, Multilayers

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Showing 5 of 25 publications

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