Dr. Hiromu Ishii Profile

Dr. Hiromu Ishii

at NTT Photonics Labs

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Author

Publications (5)

Proceedings Article | 2 October 2001 Paper

Method for testing electrostatic discharge tolerance for fingerprint sensor LSI

Yasuyuki Tanabe, Hideyuki Unno, Katsuyuki Machida, Norio Sato, Hiromu Ishii, Satoshi Shigematsu, Hiroki Morimura, Hakaru Kyuragi

Proceedings Volume 4558, (2001) https://doi.org/10.1117/12.442989

KEYWORDS: Sensors, Electrodes, Tolerancing, CMOS sensors, Capacitance, Scanning electron microscopy, Image sensors, Photography, Fingerprint recognition, Reliability

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Proceedings Article | 28 September 2001 Paper

Gold damascene interconnect technology for millimeter-wave photonics on silicon

Hiromu Ishii, Shouji Yagi, Tadashi Minotani, Yakov Royter, Kazuhisa Kudou, Masaki Yano, Tadao Nagatsuma, Katsuyuki Machida, Hakaru Kyuragi

Proceedings Volume 4557, (2001) https://doi.org/10.1117/12.442947

KEYWORDS: Gold, Silicon, Chemical mechanical planarization, Iodine, Extremely high frequency, Semiconducting wafers, Abrasives, Photonics, Dielectrics, Oxidation

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Proceedings Article | 18 December 2000 Paper

Application and control of widely tunable lasers in HD WDM networks

Jens Buus, Geert Morthier, Gert Sarlet, Roel Baets, P. Zouganeli, Andre Mlonyeni, Aasmund Sudbo, Bjoern Broberg, Pierre-Jean Rigole, Hiromu Ishii, Yuzo Yoshikuni, S. Borley, John Rawsthorne, Ronan O'Dowd, Gavin Mulvihill

Proceedings Volume 4111, (2000) https://doi.org/10.1117/12.422169

KEYWORDS: Tunable lasers, Switching, Transmitters, Modulation, Calibration, Feedback control, Wavelength division multiplexing networks, Receivers, Modulators, Optical filters

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Proceedings Article | 20 October 2000 Paper

Microfabrication technology for high-speed Si-based systems

Hiromu Ishii, Shouji Yagi, Kunio Saito, Akihiko Hirata, Kazuhisa Kudou, Masaki Yano, Tadao Nagatsuma, Katsuyuki Machida, Hakaru Kyuragi

Proceedings Volume 4230, (2000) https://doi.org/10.1117/12.404913

KEYWORDS: Copper, Silicon, Chemical mechanical planarization, Ruthenium, Antennas, Nickel, Electroless plating, Gold, Dielectrics, Microfabrication

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Proceedings Article | 4 September 1998 Paper

Ultrathin film fully depleted CMOS/SIMOX technology with selective CVD tungsten and its application to LSIs

Yasuhiro Sato, Toshihiko Kosugi, Hiromu Ishii

Proceedings Volume 3506, (1998) https://doi.org/10.1117/12.323974

KEYWORDS: Resistance, Silicon, Tungsten, Chemical vapor deposition, Transmission electron microscopy, Oxides, Electronics, Logic, Capacitance, Microelectronics

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