Mr. Hiroshi Yasuda Profile

Hiroshi Yasuda

at ASET

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 23 September 2009 Paper

Exposure results with four column cells in multicolumn EB exposure system

Akio Yamada, Hiroshi Yasuda, Masaki Yamabe

Proceedings Volume 7488, 74881F (2009) https://doi.org/10.1117/12.829732

KEYWORDS: Calibration, Electron beams, Beam shaping, Analog electronics, Photomasks, Lenses, Power supplies, Inspection, Error analysis, Electromagnetism

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Proceedings Article | 11 May 2009 Paper

Present status of multi-column cell exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7379, 737918 (2009) https://doi.org/10.1117/12.824285

KEYWORDS: Analog electronics, Photomasks, Data corrections, Electron beams, Electromagnetism, Power supplies, Lenses, Digital electronics, Vestigial sideband modulation, Beam shaping

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Proceedings Article | 17 October 2008 Paper

E-beam exposure system using multi column cell (MCC) with CP for mask writing

Akio Yamada, Hiroshi Yasuda, Masaki Yamabe

Proceedings Volume 7122, 71220K (2008) https://doi.org/10.1117/12.801564

KEYWORDS: Beam shaping, Electron beams, Data corrections, Vestigial sideband modulation, Calibration, Lenses, Electromagnetism, Analog electronics, Digital electronics, Inspection

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Proceedings Article | 17 October 2008 Paper

Concurrent optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Masaki Yamabe, Tadao Inoue, Masahiro Shoji, Hiroshi Yasuda, Hiromichi Hoshi, Masakazu Tokita

Proceedings Volume 7122, 712220 (2008) https://doi.org/10.1117/12.802966

KEYWORDS: Photomasks, Inspection, Manufacturing, Data conversion, Parallel processing, Diagnostics, System integration, Metals, Design for manufacturing, Semiconducting wafers

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Proceedings Article | 19 May 2008 Paper

Multi column cell (MCC) e-beam exposure system for mask writing

Hiroshi Yasuda, Akio Yamada, Masaki Yamabe

Proceedings Volume 7028, 70280B (2008) https://doi.org/10.1117/12.793019

KEYWORDS: Photomasks, Beam shaping, Digital electronics, Vestigial sideband modulation, Inspection, Analytical research, Digital electronic circuits, Electronics, Servomechanisms, Signal detection

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Proceedings Article | 6 December 2004 Paper

A proposal for an MCC (multi-column cell with lotus root lens) system to be used as a mask-making e-beam tool

Hiroshi Yasuda, Takeshi Haraguchi, Akio Yamada

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568255

KEYWORDS: Beam shaping, Mask making, Vestigial sideband modulation, Glasses, Magnetism, Electromagnetism, Optical amplifiers, Line edge roughness, Electron beams, Edge roughness

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Proceedings Article | 7 July 1997 Paper

Impact of the Coulomb interaction effect on delineating densely repeated 0.1-um patterns using electron-beam block exposure

Kimitoshi Takahashi, Satoru Yamazaki, Manabu Ohno, Hitoshi Watanabe, Takayuki Sakakibara, Masami Satoh, Takeo Nagata, Akio Yamada, Hiroshi Yasuda, Yasuo Nara, Nobuo Sasaki

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275768

KEYWORDS: Resolution enhancement technologies, Electron beams, Lithography, Silicon, Electron beam lithography, Tantalum, Scanning electron microscopy, Photomicroscopy, Very large scale integration

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Proceedings Article | 25 October 1995 Paper

MPEG impact for industries and standardization fields

Hiroshi Yasuda

Proceedings Volume 10282, 102820I (1995) https://doi.org/10.1117/12.227957

KEYWORDS: Multimedia

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Showing 5 of 8 publications

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