Mr. Hiroyuki Nakano Profile

Hiroyuki Nakano

at Sony Atsugi Technology Ctr

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Author

Publications (12)

Proceedings Article | 20 April 2011 Paper

Automated CD-SEM recipe creation technology for mass production using CAD data

Toshikazu Kawahara, Masamichi Yoshida, Masashi Tanaka, Sanyu Ido, Hiroyuki Nakano, Naokaka Adachi, Yuichi Abe, Wataru Nagatomo

Proceedings Volume 7971, 79712V (2011) https://doi.org/10.1117/12.890215

KEYWORDS: Computer aided design, Scanning electron microscopy, Inspection equipment, Optical alignment, Semiconducting wafers, Semiconductors, Algorithm development, Image processing, Signal processing, Semiconductor manufacturing

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Proceedings Article | 29 March 2006 Paper

Optimization of dual BARC structures for hyper-NA immersion lithography

Nobuyuki Matsuzawa, Boontarika Thunnakart, Ken Ozawa, Yuko Yamaguchi, Hiroyuki Nakano, Hiroichi Kawahira

Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563

KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

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Proceedings Article | 29 March 2006 Paper

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie

Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002

KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

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Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

Analysis of critical dimension uniformity for LEEPL

Masaki Yoshizawa, Kazuya Iwase, Hiizu Ohtorii, Kumiko Oguni, Hiroki Hane, Keiko Amai, Shigeru Moriya, Hiroyuki Nakano, Tetsuya Kitagawa

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Edge roughness, Electrons, Scanning electron microscopy, Scattering, Semiconducting wafers, Lithography, Image enhancement

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 28 August 2003 Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Tomonori Motohashi, Nobuo Shimazu, Hiroyuki Nakano, Shinji Omori, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Lithography, Optical alignment, Distortion, Overlay metrology, Resolution enhancement technologies, Silicon carbide, Cadmium sulfide

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Proceedings Article | 16 June 2003 Paper

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Hiroyuki Nakano, Shinichiro Nohdo, Kumiko Oguni, Tomonori Motohashi, Masaki Yoshizawa, Tetsuya Kitagawa, Shigeru Moriya

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484429

KEYWORDS: Charged-particle lithography, Lithography, Photoresist processing, Electron beam lithography, Image resolution, Silicon, Oxides, Electron beams, Chemically amplified resists, Photomasks

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Proceedings Article | 1 August 2002 Paper

Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node

Hiroyuki Nakano, Kumiko Oguni, Shinichiro Nohdo, Kaoru Koike, Shigeru Moriya

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476996

KEYWORDS: Photomasks, Charged-particle lithography, Optical alignment, Lithography, Semiconducting wafers, Electron beam lithography, Projection lithography, Photoresist processing, Etching, Dry etching

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Proceedings Article | 17 May 1994 Paper

SiOxNy:H, high-performance antireflective layer for current and future optical lithography

Tohru Ogawa, Hiroyuki Nakano, Tetsuo Gocho, Toshiro Tsumori

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175463

KEYWORDS: Photoresist materials, Lithography, Excimer lasers, Absorption, Reflectivity, Refractive index, 193nm lithography, Interfaces, Silicon films, Silicon

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Proceedings Article | 30 April 1993 Paper

Frequency stabilization and frequency control of a semiconductor laser using the Faraday effect of the Rb absorption line

Takashi Sato, Takao Nakazawa, Takashi Ueno, Hiroyuki Nakano, Minoru Shimba

Proceedings Volume 1837, (1993) https://doi.org/10.1117/12.143702

KEYWORDS: Rubidium, Modulation, Magnetism, Absorption, Semiconductor lasers, Laser stabilization, Zeeman effect, Polarization, Chemical species, Absorption spectroscopy

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Showing 5 of 12 publications

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