Hojune Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 26 August 2024 Paper
Proceedings Volume 13177, 131770V (2024) https://doi.org/10.1117/12.3032199
KEYWORDS: Error analysis, Semiconducting wafers, Calibration, Logic, Overlay metrology, Logic devices, Simulations, Palladium, Optical alignment, Image registration, Photomasks

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC1295605 (2024) https://doi.org/10.1117/12.3009572
KEYWORDS: Extreme ultraviolet, Logic

Proceedings Article | 6 April 2015 Paper
Patrick Kearney, Tat Ngai, Anil Karumuri, Jung Yum, Hojune Lee, David Gilmer, Tuan Vo, Frank Goodwin
Proceedings Volume 9422, 94220H (2015) https://doi.org/10.1117/12.2087773
KEYWORDS: Photomasks, Extreme ultraviolet, Reflectivity, Sputter deposition, Multilayers, Semiconducting wafers, Ion beams, Manufacturing, Silicon, EUV optics

Proceedings Article | 16 September 2014 Paper
Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, Sanghee Lee, Inkyun Shin, Shuichi Tamamushi, Chan-Uk Jeon
Proceedings Volume 9235, 92350Y (2014) https://doi.org/10.1117/12.2065930
KEYWORDS: Finite element methods, Critical dimension metrology, Vestigial sideband modulation, Photomasks, Beam shaping, Chemical reactions, Electron beams, Heat flux, Chemical analysis, Thermal effects

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 925606 (2014) https://doi.org/10.1117/12.2069731
KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Image processing, Backscatter, Beam controllers, Calibration

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810
KEYWORDS: Etching, Critical dimension metrology, Chromium, Photomasks, Curium, Ions, Electron beams, Plasma etching, Photoresist processing, Information operations

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Photoresist processing, Optical proximity correction, Mask making, Semiconductors, Manufacturing, Computer simulations

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62831J (2006) https://doi.org/10.1117/12.681744
KEYWORDS: Photomasks, Particles, Inspection, Laser systems engineering, Mask making, SRAF, Printing, Semiconducting wafers, Light sources, Optical simulations

Proceedings Article | 20 August 2004 Paper
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557713
KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Electron beams, Modulation, Monte Carlo methods, Optical testing, Optical simulations, Systems modeling, Laser scattering

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518283
KEYWORDS: Monte Carlo methods, Modulation, Etching, Critical dimension metrology, Photomasks, Scattering, Dry etching, Lithography, Cadmium, Error analysis

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092
KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099
KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

Showing 5 of 12 publications
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