Dr. Hsu-Ting Huang Profile

Dr. Hsu-Ting Huang

Chief Scientist

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Author

Publications (13)

Proceedings Article | 19 March 2015 Paper

Simulation of AIMS measurements using rigorous mask 3D modeling

Chih-Shiang Chou, Hsu-Ting Huang, Fu-Sheng Chu, Yuan-Chih Chu, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9424, 94241A (2015) https://doi.org/10.1117/12.2085113

KEYWORDS: Photomasks, 3D modeling, Inspection, Diffraction, 3D metrology, Semiconducting wafers, 3D image processing, Calibration, Scattering, Wafer inspection

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Proceedings Article | 1 April 2013 Paper

Process and proximity correction, and verification for extreme ultraviolet lithography

Gökhan Perçin, Huixiong Dai, Hsu-Ting Huang, Anwei Liu, Ali Mokhberi, Xin Zheng, Chris Ngai

Proceedings Volume 8679, 86790X (2013) https://doi.org/10.1117/12.2011666

KEYWORDS: Photomasks, Calibration, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Extreme ultraviolet, Ultraviolet radiation, Metals, High volume manufacturing, Semiconductors

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Proceedings Article | 23 March 2012 Paper

Model calibration and slit position effect on full-mask process and proximity correction for extreme ultraviolet lithography

Hsu-Ting Huang, Huixiong Dai, Ali Mokhberi, Xumou Xu, Anwei Liu, Chris Ngai

Proceedings Volume 8322, 83221K (2012) https://doi.org/10.1117/12.916502

KEYWORDS: Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Finite element methods, Metals, Ultraviolet radiation, Back end of line

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Proceedings Article | 13 March 2012 Paper

Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Tamer Coskun, Huixiong Dai, Vishnu Kamat, Ching-Mei Hsu, Gaetano Santoro, Chris Ngai, Mario Reybrouck, Grozdan Grozev, Hsu-Ting Huang

Proceedings Volume 8326, 83260V (2012) https://doi.org/10.1117/12.918459

KEYWORDS: Photomasks, Source mask optimization, Semiconducting wafers, Image processing, Electroluminescence, Standards development, Nanoimprint lithography, Optical lithography, 3D modeling, Data modeling

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Proceedings Article | 23 March 2011 Paper

Full-chip OPC and verification with a fast mask 3D model

Hsu-Ting Huang, Ali Mokhberi, Huixiong Dai, Chris Ngai

Proceedings Volume 7973, 79732R (2011) https://doi.org/10.1117/12.879841

KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, 3D metrology, Semiconducting wafers, Calibration, Lithography, Scattering, Optical lithography, 3D image processing

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Proceedings Article | 23 March 2011 Paper

Accounting for mask topography effects in source-mask optimization for advanced nodes

Tamer Coskun, Huixiong Dai, Hsu-Ting Huang, Vishnu Kamat, Chris Ngai

Proceedings Volume 7973, 79730P (2011) https://doi.org/10.1117/12.879704

KEYWORDS: Photomasks, 3D modeling, Source mask optimization, Data modeling, Semiconducting wafers, Optimization (mathematics), Calibration, Optical proximity correction, Contrast sensitivity, Nanoimprint lithography

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Proceedings Article | 11 May 2009 Paper

Effect of scanner illumination and lens transmittance signatures on OPC accuracy

Hsu-Ting Huang, Apo Sezginer, Jacek Tyminski

Proceedings Volume 7379, 737910 (2009) https://doi.org/10.1117/12.824277

KEYWORDS: Optical proximity correction, Scanners, Calibration, Photomasks, Data modeling, Polarization, Lithography, Tolerancing, Systems modeling, Projection systems

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Proceedings Article | 20 October 2006 Paper

PPC model build methodology: sequential litho and etch verification

Ali Mokhberi, Vishnu Kamat, Apo Sezginer, Franz Zach, Gökhan Perçin, Jesus Carrero, Hsu-Ting Huang

Proceedings Volume 6349, 63491Z (2006) https://doi.org/10.1117/12.692931

KEYWORDS: Etching, Calibration, Data modeling, Semiconducting wafers, Particles, Scanning electron microscopy, Chromatic aberrations, Performance modeling, Wafer-level optics, Photomasks

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Proceedings Article | 20 March 2006 Paper

Building a computational model for process and proximity compensation

Gökhan Perçin, Hsu-Ting Huang, Franz Zach, Apo Sezginer, Ali Mokhberi

Proceedings Volume 6154, 61543N (2006) https://doi.org/10.1117/12.656501

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Photomasks, Data modeling, Process modeling, Calibration, Lithography, Cadmium sulfide, Metrology

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Proceedings Article | 14 March 2006 Paper

RET for the wiring layer of a 3D memory

Yung-Tin Chen, Paul Poon, Chris Petti, Vishnu Kamat, Apo Sezginer, Hsu-Ting Huang

Proceedings Volume 6156, 61561E (2006) https://doi.org/10.1117/12.656725

KEYWORDS: Photomasks, Resolution enhancement technologies, Bridges, Scanning electron microscopy, Optical proximity correction, Image segmentation, Array processing, Manufacturing, Solids, Critical dimension metrology

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Proceedings Article | 14 March 2006 Paper

Optimal segmentation of polygon edges

Apo Sezginer, Bayram Yenikaya, Hsu-Ting Huang, Vishnu Kamat, Yung-Tin Chen

Proceedings Volume 6156, 61561G (2006) https://doi.org/10.1117/12.656695

KEYWORDS: Image segmentation, Photomasks, Image processing algorithms and systems, Optical proximity correction, Optimization (mathematics), Tolerancing, Data modeling, Detection and tracking algorithms, Manufacturing, Semiconducting wafers

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Proceedings Article | 13 March 2006 Paper

Sequential PPC and process-window-aware mask layout synthesis

Apo Sezginer, Franz Zach, Bayram Yenikaya, Jesus Carrero, Hsu-Ting Huang

Proceedings Volume 6156, 615613 (2006) https://doi.org/10.1117/12.656667

KEYWORDS: Etching, Photomasks, Process modeling, Model-based design, Lithography, Data modeling, Photoresist processing, Tolerancing, Image processing, Semiconducting wafers

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Proceedings Article | 2 June 2003 Paper

Scatterometry-based overlay metrology

Hsu-Ting Huang, Gayathri Raghavendra, Apo Sezginer, Kenneth Johnson, Fred Stanke, Michelle Zimmerman, Cristina Cheung, Makoto Miyagi, Bhanwar Singh

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483668

KEYWORDS: Overlay metrology, Scatterometry, Reticles, Semiconducting wafers, Photomasks, Optical properties, Diffraction gratings, Metals, Scatter measurement, Diffraction

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Showing 5 of 13 publications

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