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Hyunseok Kim
at Chonnam National Univ
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Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Approach for enhancing sensitivity of tin-oxo cluster resist for high NA extreme UV lithography
Yejin Ku, Gayoung Kim, Min Seung Kim, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Seohyeon Lee, Byung Jun Jung, Changhyeon Lee, Hyunseok Kim, Su-Mi Hur, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Proceedings Volume 12957, 1295706 (2024) https://doi.org/10.1117/12.3010838
KEYWORDS: Extreme ultraviolet lithography, Solubility, Electron beam lithography, Thin films, Extreme ultraviolet, Lithography
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