Dr. Jaehyuk Chang Profile

Dr. Jaehyuk Chang

at Univ of Wisconsin-Madison

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Author

Publications (7)

Proceedings Article | 6 December 2004 Paper

Simulating the process flow of the Nikon EPL new geometry mask

Jaehyuk Chang, Roxann Engelstad, Edward Lovell, Michael Sogard

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569315

KEYWORDS: Photomasks, Electron beam lithography, Semiconducting wafers, Silicon, Device simulation, Oxides, Mask making, Projection lithography, Etching, Semiconductors

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Proceedings Article | 2 June 2004 Paper

Predicting microfluidic response during immersion lithography scanning

Alexander Wei, Gerald Dicks, Amr Abdo, Gregory Nellis, Roxann Engelstad, Jaehyuk Chang, Edward Lovell, William Beckman

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568024

KEYWORDS: Liquids, Semiconducting wafers, Immersion lithography, Polymers, Microfluidics, Refraction, Absorption, Optical simulations, Refractive index, Wafer-level optics

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Proceedings Article | 2 June 2004 Paper

Hard pellicle investigation for 157-nm lithography: impact on overlay

Richard Bruls, Tammo Uitterdijk, Orlando Cicilia, Peter De Bisschop, Michael Kocsis, Andrew Grenville, Chris Van Peski, Roxann Engelstad, Jaehyuk Chang, Eric Cotte, Kaname Okada, Kazushige Ohta, Hitoshi Mishiro, Shinya Kikugawa

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568003

KEYWORDS: Pellicles, Reticles, Distortion, Lithography, Overlay metrology, Polymers, Semiconducting wafers, Fluorine, Polymer thin films, Refraction

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Proceedings Article | 20 May 2004 Paper

Modeling LEEPL mask fabrication processes

Xabier Azkorra, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Jaehyuk Chang, Jaewoong Sohn, Madhura Nataraju, Hideyuki Eguchi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546927

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electrodes, Mask making, Silicon, 3D modeling, Printing, Lithography, Device simulation

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Proceedings Article | 16 June 2003 Paper

Comparison of EUV and optical device wafer heating

Jaehyuk Chang, Roxann Engelstad, Edward Lovell

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490137

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Optical lithography, Thermal modeling, Performance modeling, Distortion, 3D modeling, Extreme ultraviolet, Convection

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Proceedings Article | 1 July 2002 Paper

Thermomechanical global response of the EUVL wafer during exposure

Jaehyuk Chang, Carl Martin, Roxann Engelstad, Edward Lovell

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472350

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Distortion, Reticles, Thermal modeling, Thermal analysis, Lithography, Finite element methods, Interfaces, Optical alignment

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Proceedings Article | 25 June 1999 Paper

Thermomechanical distortions of advanced optical reticles during exposure

Jaehyuk Chang, Amr Abdo, Byung-Kyu Kim, Theodore Bloomstein, Roxann Engelstad, Edward Lovell, William Beckman, John Mitchell

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351144

KEYWORDS: Reticles, Silica, Heat flux, Thermal modeling, Performance modeling, Convection, Photomasks, Calcium, Thermography, Optical lithography

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Showing 5 of 7 publications

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