Dr. Jae Yeol Maeng Profile

Dr. Jae Yeol Maeng

at GlobalFoundries

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Author

Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Contour metrology for process matching and OPC qualification with machine learning-based site selection

Jae Yeol Maeng, Soo Kheng Tan, Yee Mei Foong, Xuefeng Zeng, Shibing Wang, Steven Lubin, Robin Chia, Angeline Chung, Ken Jantzen, Yuyang Sun

Proceedings Volume 12955, 129553N (2024) https://doi.org/10.1117/12.3012681

KEYWORDS: Metrology, Scanning electron microscopy, Contour extraction, Machine learning, Optical proximity correction, Image processing, Electronic design automation, Design

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Proceedings Article | 13 March 2012 Paper

Full-chip correction of implant layer accounting for underlying topography

Minchul Oh, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Aasutosh Dave, John Sturtevant, Uwe Hollerbach, Thuy Do, Yuri Granik, Kostas Adam, Juhwan Kim, Cynthia Zhu, S. W. Jung

Proceedings Volume 8326, 83262R (2012) https://doi.org/10.1117/12.917984

KEYWORDS: Photomasks, Optical proximity correction, Oxides, Critical dimension metrology, Semiconducting wafers, Reflectivity, Calibration, Data modeling, Model-based design, Photoresist materials

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Proceedings Article | 13 March 2012 Paper

Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects

Songyi Park, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Xiaobo Xie, Song Lan, Mu Feng, Venu Vellanki, Joobyoung Kim, Stanislas Baron, Hua-Yu Liu, Stefan Hunsche, Soung-Su Woo, Seung-Hoon Park, Jong-Tai Yoon

Proceedings Volume 8326, 83260O (2012) https://doi.org/10.1117/12.918000

KEYWORDS: Semiconducting wafers, Optical proximity correction, Calibration, Photomasks, Optical lithography, Critical dimension metrology, Data modeling, Silicon, Photoresist materials, Reflection

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Proceedings Article | 22 March 2008 Paper

Challenges of implementing contour modeling in 32nm technology

Daniel Fischer, Geng Han, James Oberschmidt, Yong Wah Cheng, Jae Yeol Maeng, Charles Archie, Wei Lu, Cyrus Tabery

Proceedings Volume 6922, 69220A (2008) https://doi.org/10.1117/12.775444

KEYWORDS: Calibration, Scanning electron microscopy, Metrology, Optical proximity correction, Critical dimension metrology, Cadmium, Data modeling, Line edge roughness, Tolerancing, Systems modeling

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