Dr. James A. Bruce Profile

Dr. James A. Bruce

Senior Engineer & Scientist

SPIE Involvement:

Author

Area of Expertise:

lithography , OPC , OPC Verification , simulation

Publications (14)

SPIE Journal Paper | 1 October 2010

Electrical validation of through-process optical proximity correction verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

JM3, Vol. 9, Issue 04, 041303, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514703

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Image processing, Optical simulations, Wafer-level optics, Optical components, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

Electrical validation of through process OPC verification limits

Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli, Edward Conrad, James Bruce, Sajan Marokkey

Proceedings Volume 7638, 76380U (2010) https://doi.org/10.1117/12.846572

KEYWORDS: Electrical breakdown, Optical proximity correction, Failure analysis, Semiconducting wafers, Lithography, Optical simulations, Process modeling, Optical lithography, Optical components, Image processing

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Proceedings Article | 4 March 2008 Paper

Predicting yield using model based OPC verification: calibrated with electrical test data

James Bruce, Tso-Hui Ting

Proceedings Volume 6925, 69250S (2008) https://doi.org/10.1117/12.773591

KEYWORDS: Optical proximity correction, Data modeling, Diffusion, Electrical breakdown, Reticles, Calibration, Semiconducting wafers, Failure analysis, Metals, Etching

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Proceedings Article | 16 November 2007 Paper

Validating optical proximity correction with models, masks, and wafers

Sajan Marokkey, Edward Conrad, Emily Gallagher, Hidehiro Ikeda, James Bruce, Mark Lawliss

Proceedings Volume 6730, 67302Q (2007) https://doi.org/10.1117/12.746685

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Photomasks, SRAF, Data modeling, Failure analysis, Image processing, Lithography, Photoresist materials

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Proceedings Article | 4 April 2007 Paper

Setting MRC rules: balancing inspection capabilities, defect sensitivity, and OPC

Ian Stobert, James Bruce, Mohamed Gheith, Ahmed Seoud

Proceedings Volume 6518, 65180B (2007) https://doi.org/10.1117/12.712418

KEYWORDS: Optical proximity correction, Photomasks, Inspection, Semiconducting wafers, Monte Carlo methods, Defect inspection, Resolution enhancement technologies, Image quality, Defect detection, Printing

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Proceedings Article | 21 March 2007 Paper

Production-worthy OPC verification methods for protecting against process variability

James Bruce, Norman Chen, Vinay Chinta, Ramon De La Cruz, Yea-Sen Lin

Proceedings Volume 6521, 65211F (2007) https://doi.org/10.1117/12.714088

KEYWORDS: Photomasks, Optical proximity correction, Image processing, Error analysis, Critical dimension metrology, Data modeling, Computer simulations, Failure analysis, Process modeling, Image quality

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Proceedings Article | 5 November 2005 Paper

Tolerable CD variation analyzer using perturbed nominal models demonstrated on altPSM

Ioana Graur, James Culp, James Bruce, Mohamed Al-Imam, Mohamed Bahnas

Proceedings Volume 5992, 59920H (2005) https://doi.org/10.1117/12.633417

KEYWORDS: Photomasks, Tolerancing, Printing, Semiconducting wafers, Image processing, Lithography, Resolution enhancement technologies, Critical dimension metrology, Process modeling, Modulation

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Proceedings Article | 5 May 2005 Paper

Model-based verification for first time right manufacturing

James Bruce, Edward Conrad, Gregory Dick, D. John Nickel, Jacek Smolinski

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.600552

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Manufacturing, Data modeling, Semiconducting wafers, Model-based design, Data archive systems, Error analysis, Reticles

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Proceedings Article | 30 July 2002 Paper

Subresolution assist feature implementation for high-performance logic gate-level lithography

Allen Gabor, James Bruce, William Chu, Richard Ferguson, Carlos Fonseca, Ronald Gordon, Kenneth Jantzen, Mukesh Khare, Mark Lavin, Woo-Hyeong Lee, Lars Liebmann, Karl Muller, Jed Rankin, Patrick Varekamp, Franz Zach

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474591

KEYWORDS: SRAF, Optical proximity correction, Logic, Binary data, Lithography, Model-based design, Image enhancement, Printing, Manufacturing, Lithographic illumination

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Proceedings Article | 14 September 2001 Paper

Optimizing style options for subresolution assist features

Lars Liebmann, James Bruce, William Chu, Michael Cross, Ioana Graur, Joshua Krueger, William Leipold, Scott Mansfield, Anne McGuire, Dianne Sundling

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435690

KEYWORDS: SRAF, Photomasks, Model-based design, Manufacturing, Optical proximity correction, Computer aided design, Lithography, Inspection, Semiconducting wafers, Data modeling

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Proceedings Article | 14 September 2001 Paper

Aids for driving lithography hard: wafer-level process control features

Emily Fisch, Reginald Bowley, James Bruce, Orest Bula

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435633

KEYWORDS: Process control, Semiconducting wafers, Lithography, Data modeling, Nose, Photomasks, Critical dimension metrology, Scanning electron microscopy, Photoresist processing, Microelectronics

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Proceedings Article | 29 June 1998 Paper

Conformality of photoresist and antireflective coatings over topography

James Bruce, Ellen Wallander

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310799

KEYWORDS: Photoresist materials, Semiconducting wafers, Optical testing, Coating, Antireflective coatings, Scanning probe microscopy, Silicon, Optical microscopy, Microscopy, Thin films

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Proceedings Article | 29 June 1998 Paper

Thin-film interference effects for thin resist films on a broadband scanner

James Bruce, Michael Caterer, Dianne Sundling

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310800

KEYWORDS: Chemical vapor deposition, Thin films, Semiconducting wafers, Data modeling, Photoresist materials, Scanners, Refractive index, Coating, Deep ultraviolet, Silicon

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Proceedings Article | 1 July 1991 Paper

Deep-UV photolithography linewidth variation from reflective substrates

Diana Dunn, James Bruce, Michael Hibbs

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44770

KEYWORDS: Reflectivity, Semiconducting wafers, Absorption, Silicon, Optical lithography, Thin films, Photoresist materials, Deep ultraviolet, Refraction, Chlorine

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Showing 5 of 14 publications

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