Dr. James E. Webb Profile

Dr. James E. Webb

Manager Microlithography Optics at Corning Incorporated

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Author

Publications (19)

Proceedings Article | 21 March 2006 Paper

The capability of a 1.3-NA μstepper using 3D EMF mask simulations

Will Conley, Jeff Meute, James Webb, Douglas Goodman, Robert Maier

Proceedings Volume 6154, 61542Y (2006) https://doi.org/10.1117/12.659684

KEYWORDS: Polarization, 3D modeling, Photomasks, Image resolution, Lithography, 3D image processing, Refraction, Imaging systems, Lithographic illumination, Birefringence

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Proceedings Article | 26 August 2005 Paper

Using multi-function components to solve optical design challenges for DUV microlithographic applications

James Webb

Proceedings Volume 5874, 587401 (2005) https://doi.org/10.1117/12.618034

KEYWORDS: Combined lens-mirror systems, Birefringence, Objectives, Chemical elements, Wavefronts, Calcium, Reflectivity, Microfluidics, Polarization, Optical design

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Proceedings Article | 28 June 2005 Paper

The capability of a 1.3NA µstepper using 3D EMF mask simulations

Will Conley, Jeff Meute, James Webb, Douglas Goodman, Robert Maier

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617224

KEYWORDS: Polarization, 3D modeling, Photomasks, Image resolution, Lithography, 3D image processing, Refraction, Lithographic illumination, Imaging systems, Birefringence

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Proceedings Article | 12 May 2005 Paper

Hyper-numerical aperture imaging challenges for 193 nm

James Webb, Robert Maier, Douglas Goodman, Will Conley

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600359

KEYWORDS: Polarization, Interfaces, Refraction, Birefringence, Wavefronts, Objectives, 3D modeling, Absorption, Silica, Plano

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Proceedings Article | 12 May 2005 Paper

High-index materials for 193 nm immersion lithography

John Burnett, Simon Kaplan, Eric Shirley, Paul Tompkins, James Webb

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600109

KEYWORDS: Birefringence, Spinel, Crystals, Transmittance, Oxides, Absorption, Immersion lithography, Water, Ultraviolet radiation, Ceramics

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Proceedings Article | 28 May 2004 Paper

Correction of 157-nm lens based on phase ring aberration extraction method

Jeff Meute, Georgia Rich, Will Conley, Bruce Smith, Lena Zavyalova, Julian Cashmore, Dominic Ashworth, James Webb, Lisa Rich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544256

KEYWORDS: Monochromatic aberrations, Wavefronts, Optics manufacturing, Manufacturing, Optical alignment, Birefringence, Phase measurement, Lithography, Reticles, Error analysis

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Proceedings Article | 28 May 2004 Paper

Immersion lithography micro-objectives

James Webb, Louis Denes

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535358

KEYWORDS: Objectives, Microfluidics, Microfluidic imaging, Wavefronts, Combined lens-mirror systems, Excimer lasers, Mirrors, Plano, Interfaces, Water

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Proceedings Article | 28 May 2004 Paper

Optical metrology for 193-nm immersion objective characterization

David Aronstein, Julie Bentley, Paul Dewa, Michael Dunn, Horst Schreiber, Thanh Nguyen, James Webb

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536383

KEYWORDS: Water, Objectives, Absorption, Optical spheres, Wavefronts, Interferometers, Liquids, Interferometry, Microscopes, Monochromatic aberrations

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Proceedings Article | 28 May 2004 Paper

Extending the Newtonian design form for ultra-high numerical aperture and immersion lithography

James Webb

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535338

KEYWORDS: Chemical elements, Birefringence, Aspheric lenses, Calcium, Water, Beam splitters, Mirrors, Immersion lithography, Reflectivity, Silica

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SPIE Journal Paper | 1 October 2002

Performance enhancement of 157 nm Newtonian catadioptric objectives

James Webb, Timothy Rich, Anthony Phillips, James Cornell

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1506373

KEYWORDS: Birefringence, Wavefronts, Crystals, Objectives, Imaging systems, Interferometry, Geometrical optics, Polarization, Combined lens-mirror systems, Scanning electron microscopy

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Proceedings Article | 30 July 2002 Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 30 July 2002 Paper

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Jeff Meute, Georgia Rich, Stefan Hien, Kim Dean, Carolyn Gondran, Julian Cashmore, Dominic Ashworth, James Webb, Lisa Rich, Paul Dewa

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474621

KEYWORDS: Fiber optic illuminators, Contamination, Optical components, Objectives, Semiconducting wafers, Mirrors, Reticles, Lithography, Wafer-level optics, Failure analysis

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Proceedings Article | 30 July 2002 Paper

Performance enhancement of 157-nm Newtonian catadioptric objectives

James Webb, Timothy Rich, Anthony Phillips, James Cornell

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474611

KEYWORDS: Birefringence, Wavefronts, Crystals, Point spread functions, Objectives, Imaging systems, Geometrical optics, Monochromatic aberrations, Interferometry, Mirrors

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Proceedings Article | 14 September 2001 Paper

Study of obscuration in catadioptric lenses

Martin McCallum, Bruce Smith, Steve Bassett, Julian Cashmore, James Webb

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435646

KEYWORDS: Nanoimprint lithography, Binary data, Combined lens-mirror systems, Lenses, Diffraction, Monochromatic aberrations, Phase shifts, Coherence (optics), Photomasks, Lens design

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Proceedings Article | 14 September 2001 Paper

Optical design forms for DUV and VUV microlithographic processes

James Webb, Julie Bentley, Paul Michaloski, Anthony Phillips, Ted Tienvieri

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435754

KEYWORDS: Objectives, Colorimetry, Combined lens-mirror systems, Mirrors, Deep ultraviolet, Inspection, Reflectivity, Surface finishing, Vacuum ultraviolet, Excimer lasers

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Proceedings Article | 14 September 2001 Paper

Error separation technique for microlithographic lens testing with null configurations

Stephen Mack, Timothy Rich, James Webb, Paul Dewa, Horst Schreiber

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435669

KEYWORDS: Wavefronts, Monochromatic aberrations, Interferometers, Lithography, Fluorine, Optical fabrication, Optical testing, Calibration, Excimer lasers, Spherical lenses

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Lithographic lens systems are continually being designed to work at shorter wavelengths and higher numerical apertures. The prospect of 157 nm F₂ excimer-based lithography presents many demanding new challenges to lithographic lens manufacturers. Lens fabricators must re-orient themselves to handling and finishing more delicate optical materials such as calcium fluoride to unprecedented surface requirements. Thin film engineers are pressed to deliver a multitude of new optical coatings, but with a dramatically limited selection of raw materials. And optical test engineers are presented with new testing challenges: among them is at-wavelength interferometric testing of lithographic objectives using an F₂ excimer laser source. Requirements for constructing such an interferometer dictate a design containing several nitrogen-purged beam paths and a camera capable of detecting 157 nm radiation. These contribute to an interferometer that is cumbersome and expensive when applied to production testing of lithographic lens assemblies. In addition, complications emerge in the interferometer design due to the relatively poor coherence in the 157 nm F₂ excimer source. Fortunately, off-wavelength sources (usually at a 'user-friendly' longer wavelength) can be applied to transmitted wavefront testing of lithographic objectives designed for shorter wavelengths, while still providing nearly perfect and predictable at-wavelength imagery. This testing approach requires additional null optics to correct for off-wavelength spherochromatism effects. We have successfully used off-wavelength 248 nm interferometer testing to characterize 193 nm ArF lens systems, and this approach has been extended to the 157 nm regime by incorporating a well-characterized null corrector. We explain methods to perform null corrector characterization: We describe a technique to separate the non-rotationally symmetric errors introduced by a multi-element null corrector from the errors in the lithographic lens under test. We also discuss methods to characterize the rotationally symmetric errors introduced by this null corrector. In addition, we describe a method to cascade the error separation algorithm such that additional non-rotationally symmetric errors are also isolated. Test results are included and discussed.

Proceedings Article | 29 December 1999 Paper

Reliability of fiber in fiber Bragg grating devices

Gajawalli Srinivasan, J. Webb

Proceedings Volume 3848, (1999) https://doi.org/10.1117/12.372771

KEYWORDS: Failure analysis, Fiber Bragg gratings, Interfaces, Reliability, Optical fibers, Mirrors, Glasses, Temperature metrology, Epoxies, Silicon

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Proceedings Article | 29 June 1998 Paper

Aberration evaluation and tolerancing of 193-nm lithographic objective lenses

Bruce Smith, James Webb, John Petersen, Jeff Meute

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310756

KEYWORDS: Nanoimprint lithography, Image processing, Photoresist processing, Monochromatic aberrations, Lithography, Lenses, Photoresist materials, Tolerancing, Lens design, Spherical lenses

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Proceedings Article | 8 August 1993 Paper

Design and analysis of a high-NA projection optical system for 0.35-um deep-UV lithography

Andrew Hill, James Webb, Anthony Phillips, James Connors

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150456

KEYWORDS: Tolerancing, Distortion, Objectives, Lithography, Wavefronts, Optical design, Optical lithography, Manufacturing, Silica, Monochromatic aberrations

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Showing 5 of 19 publications

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