Mr. Jan F. W. Cavelaars Profile

Jan F. W. Cavelaars

at SUNY Poly SEMATECH

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Author

Publications (2)

Proceedings Article | 10 May 2005 Paper

SEMATECH’s world class EUV mask blank metrology toolset

Soon-Cheon Seo, Jan Cavelaars, John Maltabes, Sang-In Han, Patrick Kearney, Dave Krick

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598860

KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Reflectivity, Inspection, Multilayers, Defect inspection, Particles, Spatial frequencies, Extreme ultraviolet lithography

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Proceedings Article | 17 December 2003 Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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