Mr. Jeong-gu Hwang Profile

Jeong-gu Hwang

at Hanyang Univ

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 24 March 2017 Paper

CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Jeong-Gu Hwang, In-Seon Kim, Guk-Jin Kim, Hee-Ra No, Byung-Hun Kim, Hye-Keun Oh

Proceedings Volume 10143, 101431U (2017) https://doi.org/10.1117/12.2261827

KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Distortion, Extreme ultraviolet, Tolerancing, Photomasks, Monochromatic aberrations, Optical lithography, Optical calibration, Scanners, Lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years