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Jerome Todeschini
at STMicroelectronics
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Author
Publications (6)
SPIE Journal Paper | 1 July 2007
Complementary dose and geometrical solutions for electron beam direct write lithography proximity effects correction: application for sub-45-nm node product manufacturing
JM3, Vol. 6, Issue 03, 033001, (July 2007) https://doi.org/10.1117/12.10.1117/1.2770472
KEYWORDS: Modulation, Critical dimension metrology, Electron beam direct write lithography, Point spread functions, Electron beam lithography, Cadmium sulfide, Electron beams, Optical lithography, Manufacturing, Backscatter
Proceedings Article | 6 May 2005 Paper
Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction
L. Pain, M. Jurdit, J. Todeschini, S. Manakli, B. Icard, B. Minghetti, G. Bervin, A. Beverina, F. Leverd, M. Broekaart, P. Gouraud, V. De Jonghe, Ph. Brun, S. Denorme, F. Boeuf, V. Wang, D. Henry
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601498
KEYWORDS: Photomasks, Electron beam direct write lithography, Manufacturing, Lithography, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Optical lithography, Standards development, Photoresist processing
Proceedings Article | 4 May 2005 Paper
Electron beam direct write process development for sub 45nm CMOS manufacturing
J. Todeschini, Laurent Pain, S. Manakli, B. Icard, V. DeJonghe, B. Minghetti, M. Jurdit, D. Henry, V. Wang
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601616
KEYWORDS: Line width roughness, Electron beam direct write lithography, Semiconducting wafers, Electron beam lithography, Electron beams, Manufacturing, Etching, Photoresist processing, Coating, Semiconductors
Proceedings Article | 20 May 2004 Paper
Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Laurent Pain, M. Jurdit, Yves LaPlanche, J. Todeschini, Serdar Manakli, G. Bervin, Ramiro Palla, A. Beverina, R. Faure, X. Bossy, H. Leininger, S. Tourniol, M. Broekaart, F. Judong, K. Brosselin, P. Gouraud, Veronique De Jonghe, Daniel Henry, M. Woo, Peter Stolk, B. Tavel, F. Arnaud
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537188
KEYWORDS: Electron beam direct write lithography, Manufacturing, Semiconducting wafers, Lithography, Optical alignment, Control systems, Electron beam lithography, Photomasks, Photoresist processing, Optics manufacturing
Proceedings Article | 16 June 2003 Paper
Mix and match capability of e-beam direct-write for the 65-nm technology
Yves Laplanche, Murielle Charpin, Laurent Pain, J. Todeschini, Daniel Henry, Pierre-Olivier Sassoulas, S. Gough, Ulf Weidenmueller, Peter Hahmann
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482342
KEYWORDS: Semiconducting wafers, Scanners, Optical alignment, Electron beam direct write lithography, Distortion, Overlay metrology, Electron beam lithography, Photomasks, Optical lithography, Error analysis
Showing 5 of 6 publications
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