Maskless photolithography was proposed to achieve the conventional and low-cost micro and nano fabrication, the pivotal of such technology was the application of digital micro-mirrors devices (DMD). Based on maskless photolithography, we designed a specific bifocal compound eyes (BCE) which made up of an array of two superimposed microlens. However, during our experiments, we found the existence of nonlinear relationships among gray levels, exposure intensity and development depths. To precise control the surface profiles, we did several tests and interpolations were used on the data we gathered. Finally, we ascertained the development depth of each grayscale, a gray mask was designed and filled to 1024*768 to fit the size of DMD.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.