Dr. Jingyu Wang Profile

Dr. Jingyu Wang

at GLOBALFOUNDRIES Inc

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Author

Publications (7)

SPIE Journal Paper | 2 January 2018

Ripple-aware optical proximity correction fragmentation for back-end-of-line designs

Jingyu Wang, William Wilkinson

JM3, Vol. 17, Issue 01, 013502, (January 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.1.013502

KEYWORDS: Optical proximity correction, Back end of line, Semiconducting wafers, Optical lithography, Photomasks, Diffraction, Lithography, Lithographic illumination, Optical instrument design, Instrumentation engineering

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Proceedings Article | 5 October 2016 Paper

Suppressing rippling with minimized corner rounding through OPC fragmentation optimization

Jingyu Wang, Alexander Wei, William Wilkinson, Norman Chen

Proceedings Volume 9985, 998528 (2016) https://doi.org/10.1117/12.2241409

KEYWORDS: Optical proximity correction, Optical lithography, Semiconducting wafers, Wafer-level optics, Image segmentation, Photomasks, Lithography, Edge roughness, Image resolution, Imaging systems

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Proceedings Article | 4 September 2015 Paper

Optimization of rule-based OPC fragmentation to improve wafer image rippling

Jingyu Wang, Alexander Wei, Piyush Verma, William Wilkinson

Proceedings Volume 9661, 96610D (2015) https://doi.org/10.1117/12.2194755

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Solids, Lithography, Diffraction, Wafer-level optics, Image segmentation, Imaging systems, Signal processing

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Proceedings Article | 18 March 2015 Paper

Hybrid OPC flow with pattern search and replacement

Piyush Verma, Shikha Somani, Yang Ping, Piyush Pathak, Rani Ghaida, Carl Babcock, Fadi Batarseh, Jingyu Wang, Sriram Madhavan, Sarah McGowan

Proceedings Volume 9426, 942611 (2015) https://doi.org/10.1117/12.2087094

KEYWORDS: Optical proximity correction, Photomasks, SRAF, Photovoltaics, Model-based design, Very large scale integration, Optical lithography, Data modeling, Image classification, Library classification systems

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Proceedings Article | 8 October 2014 Paper

Pattern-based pre-OPC operation to improve model-based OPC runtime

Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, Sriram Madhavan

Proceedings Volume 9235, 923506 (2014) https://doi.org/10.1117/12.2068998

KEYWORDS: Optical proximity correction, Photomasks, Very large scale integration, Model-based design, Logic, Lithography, Image classification, Library classification systems, Computer simulations, Optics manufacturing

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Proceedings Article | 8 October 2014 Paper

Conducting OPC retargeting as guided by principles of classical dynamics

Jingyu Wang, Piyush Verma, Alexander Wei, William Wilkinson

Proceedings Volume 9235, 923507 (2014) https://doi.org/10.1117/12.2067814

KEYWORDS: Optical proximity correction, Semiconducting wafers, Photomasks, Visualization, Lithography, Metals, Calibration, Solids, Patents, Shape analysis

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Proceedings Article | 28 August 2010 Paper

Optical tweezers as a force sensor for separating dielectrophoresis and AC electroosmosis forces

Jingyu Wang, H. Daniel Ou-Yang

Proceedings Volume 7762, 77621U (2010) https://doi.org/10.1117/12.860831

KEYWORDS: Dielectrophoresis, Particles, Optical tweezers, Electrodes, Sensors, Microfluidics, Liquids, Interfaces, Ions, Amplitude modulation

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Showing 5 of 7 publications

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