I developed a complete set of optical critical dimension (OCD) metrology approaches for the in-line monitoring of sub-22 nm node semiconductor transistors.

I proposed a robust OCD metrology strategy for the in-chip metrology of dynamic random access memory (DRAM), which achieved the highest measurement accuracy so far.

I am currently working on the label-free super-resolution imaging for living organisms and super-enhanced OCD metrology and defect inspection systems for the in-line monitoring of next-generation semiconductor transistors and quantum dots used in next generation flexible displays. To achieve these goals, I am fusing a diverse portfolio of technologies, including semi-analytic electromagnetic modeling, surface plasmon resonance, inverse optimization, engineered materials, semiconductor fabrication processes, optical waveguides, high numerical aperture imaging, engineering optics, and high precision micro- positioning.

My research interests include optical metrology, optical inspection, nanophotonics, bioimaging, novel optical instruments for super-resolution imaging, and metasurface.