CONFERENCE PROCEEDINGS
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Joan McCall
Senior Process Engineer at Intel Corp
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Author
Publications (5)
Proceedings Article | 30 September 2009 Paper
Aerial image based die-to-model inspections of advanced technology masks
Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan
Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners
Proceedings Article | 23 September 2009 Paper
Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks
Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, Steffen Schulze
Proceedings Volume 7488, 748823 (2009) https://doi.org/10.1117/12.833443
KEYWORDS: Inspection, Photomasks, Metrology, Vestigial sideband modulation, Data conversion, Data processing, Manufacturing, Standards development, Semiconducting wafers, Computer simulations
Proceedings Article | 11 March 2002 Paper
Integrated method of mask data checking and inspection data prep for manufacturable mask inspection: inspection rule violations
Joan McCall, Vinod Reddy, Hyung Kim, Mark Babasa
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458288
KEYWORDS: Inspection, Photomasks, Optical proximity correction, Dysprosium, Manufacturing, Opacity, Databases, Semiconducting wafers, Communication engineering, Product engineering
Proceedings Article | 8 December 1995 Paper
Effect of laser mask repair-induced residue and quartz damage in sub-half-micrometer DUV wafer processes
Pei-yang Yan, Qi-De Qian, Joan McCall, Joseph Langston, Yu Ger, Joe Cho, Robert Hainsey
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228166
KEYWORDS: Photomasks, Quartz, Semiconducting wafers, Carbon, Scanning electron microscopy, Atomic force microscopy, Printing, Ion beams, Laser ablation, Deep ultraviolet
Proceedings Article | 8 December 1995 Paper
Printability of opaque repairs for DUV EPSM clear defects at sub-half-micrometer design rules
Pei-yang Yan, Joan McCall, Robert Hainsey
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228188
KEYWORDS: Photomasks, Opacity, Quartz, Semiconducting wafers, Scanning electron microscopy, Deep ultraviolet, Laser ablation, Solids, Printing, Error analysis
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