Dr. Johannes van Wingerden Profile

Dr. Johannes van Wingerden

at Technische Univ Delft

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 14 March 2006 Paper

Experimental verification of improved printability for litho-driven designs

Johannes van Wingerden, Laurent Le Cam, Rene Wientjes, Michael Benndorf, Yorick Trouiller, Jerome Belledent, Rob Morton, Yuri Aksenov

Proceedings Volume 6156, 61560O (2006) https://doi.org/10.1117/12.656359

KEYWORDS: Critical dimension metrology, Lithography, Logic, Scanners, Semiconductors, Transistors, Design for manufacturing, Group IV semiconductors, Optical proximity correction, Process control

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Proceedings Article | 5 May 2005 Paper

Evaluating design for manufacturing with process capability analysis

Johannes van Wingerden, Laurent Le Cam, Manish Garg, Yuri Aksenov, Peter Dirksen

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.599648

KEYWORDS: Photomasks, Critical dimension metrology, Manufacturing, Semiconducting wafers, Design for manufacturing, Image processing, Electroluminescence, Lithography, Data modeling, Scanners

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SPIE Journal Paper | 1 April 2004

Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65 nm device node

Patrick Montgomery, Lloyd Litt, Willard Conley, Kevin Lucas, Johannes van Wingerden, Geert Vandenberghe, Vincent Wiaux

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669524

KEYWORDS: Photomasks, Printing, Critical dimension metrology, Lithography, Phase shifts, Optical lithography, Metals, Nanoimprint lithography, Semiconducting wafers, Image transmission

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Proceedings Article | 17 December 2003 Paper

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

Patrick Montgomery, Kevin Lucas, Lloyd Litt, Will Conley, Eric Fanucchi, Johannes Van Wingerden, Geert Vandenberghe, Vincent Wiaux, Darren Taylor, Michael Cangemi, Bryan Kasprowicz

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518022

KEYWORDS: Photomasks, Inspection, Printing, Reticles, Critical dimension metrology, Optical lithography, Manufacturing, Metals, 193nm lithography, Nanoimprint lithography

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Proceedings Article | 26 June 2003 Paper

Lithographic process optimization using process capability analysis

Johannes van Wingerden, Peter Dirksen, Casper Juffermans, Yorick Trouiller

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485520

KEYWORDS: Critical dimension metrology, Photomasks, Image processing, Monte Carlo methods, Semiconducting wafers, Electroluminescence, Process control, Optical proximity correction, Lithography, Statistical analysis

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Proceedings Article | 26 June 2003 Paper

Process, design, and optical proximity correction requirements for the 65nm device generation

Kevin Lucas, Patrick Montgomery, Lloyd Litt, Will Conley, Sergei Postnikov, Wei Wu, Chi-Min Yuan, Marc Olivares, Kirk Strozewski, Russell Carter, James Vasek, David Smith, Eric Fanucchi, Vincent Wiaux, Geert Vandenberghe, Olivier Toublan, Arjan Verhappen, Jan Kuijten, Johannes van Wingerden, Bryan Kasprowicz, Jeffrey Tracy, Christopher Progler, Eugene Shiro, Igor Topouzov, Karl Wimmer, Bernard Roman

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485498

KEYWORDS: Reticles, Optical lithography, Optical proximity correction, Lithography, 193nm lithography, Scanners, Logic, Optical design, Lithographic illumination, SRAF

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Proceedings Article | 22 August 2001 Paper

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Sylvain Muckenhirn, A. Meyyappan, Kelvin Walch, Mark Maslow, Geert Vandenberghe, Johannes van Wingerden

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436742

KEYWORDS: Photomasks, Scanning probe microscopy, Quartz, Phase shifts, Chromium, Semiconducting wafers, Etching, Silicon, Capillaries, Computer aided design

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Proceedings Article | 26 July 1999 Paper

Optimization of substrate reflectivity, resist thickness, and resist absorption for CD control and resolution

Johannes van Wingerden

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354408

KEYWORDS: Reflectivity, Critical dimension metrology, Absorption, Reflection, Interfaces, Electroluminescence, Optical lithography, Photomasks, Etching, Bottom antireflective coatings

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Proceedings Article | 29 June 1998 Paper

Bottom-ARC optimization methodology for 0.25-um lithography and beyond

Maaike Op de Beeck, Geert Vandenberghe, Patrick Jaenen, Feng-Hong Zhang, Christie Delvaux, Paul Richardson, Ilse van Puyenbroeck, Kurt Ronse, James Lamb, Johan van der Hilst, Johannes van Wingerden

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310762

KEYWORDS: Critical dimension metrology, Etching, Reflectivity, Semiconducting wafers, Chlorine, Ions, Lithography, Photoresist processing, Absorption, Information operations

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SPIE Journal Paper | 1 November 1992

Optical profiler for low reflectance ultrasmooth surfaces

Johannes van Wingerden, Hans Frankena, Bertram van der Zwan

OE, Vol. 31, Issue 11, (November 1992) https://doi.org/10.1117/12.10.1117/12.59944

KEYWORDS: Microscopes, Silicon, Lamps, Surface finishing, Glasses, Semiconducting wafers, Mercury, Phase shifts, Light sources, Phase shift keying

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SPIE Journal Paper | 1 May 1992

Production and measurement of superpolished surfaces

Johannes van Wingerden, Hans Frankena, Bertram van der Zwan

OE, Vol. 31, Issue 05, (May 1992) https://doi.org/10.1117/12.10.1117/12.56151

KEYWORDS: Surface finishing, Polishing, Light scattering, Surface roughness, Scattering, Photovoltaics, Scatter measurement, Particles, Microscopes, Optical testing

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Showing 5 of 11 publications

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