Mr. Jonas Bartsch Profile

Jonas Bartsch

at Bremer Institut für angewandte Strahltechnik GmbH

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Author

Publications (5)

Proceedings Article | 20 June 2021 Poster + Presentation + Paper

Vision threads: a novel approach to generic camera calibration

Shishir Gauchan, Jonas Bartsch, Ralf Bergmann

Proceedings Volume 11787, 117870H (2021) https://doi.org/10.1117/12.2592296

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Proceedings Article | 20 June 2021 Poster + Presentation + Paper

Qualification of holistic and generic camera-system calibration by fringe projection

Jonas Bartsch, Yann Sperling, Ralf Bergmann

Proceedings Volume 11787, 117870G (2021) https://doi.org/10.1117/12.2592295

KEYWORDS: Calibration, Cameras, Stereoscopic cameras, LCDs, Imaging systems, Visual process modeling, 3D metrology, Refraction, Ray tracing, Projection systems

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Proceedings Article | 3 September 2019 Paper

Phase measurement deviations in deflectometry due to properties of technical surfaces

Shekhar Kumar Patra, Jonas Bartsch, Michael Kalms, Ralf Bergmann

Proceedings Volume 11102, 111020Q (2019) https://doi.org/10.1117/12.2527894

KEYWORDS: Phase measurement, Cameras, Manufacturing, Deflectometry, Diamond turning, Reflection, Surface finishing, Surface properties, Scattering, Imaging systems

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Proceedings Article | 4 September 2018 Presentation + Paper

Metric for comparison of generic camera calibration

Martin H. U. Prinzler, Jonas Bartsch, Michael Kalms, Ralf Bergmann

Proceedings Volume 10750, 107500I (2018) https://doi.org/10.1117/12.2319366

KEYWORDS: Calibration, Cameras, Visual process modeling, Imaging systems, Optical calibration, Metrology, Optical metrology, CCD cameras, Precision calibration

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Proceedings Article | 24 May 2018 Presentation + Paper

Effects of non-ideal display properties in phase measuring deflectometry: A model-based investigation

Jonas Bartsch, Johann R. Nüß, Martin H. Prinzler, Michael Kalms, Ralf Bergmann

Proceedings Volume 10678, 106780Y (2018) https://doi.org/10.1117/12.2306463

KEYWORDS: Cameras, Device simulation, Calibration, Deflectometry, Phase measurement, Model-based design, Visual process modeling, Reflection, Refraction, Displays

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