Dr. Jongju Park Profile

Dr. Jongju Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 13 November 2024 Presentation

Development of laser-assisted CD correction system in EUV masks

JongKeun Oh, Geonhui Park, YongWoo Kim, JongJu Park, JungJin Kim, SangHee Lee, Hyun Yoon, Seryeyohan Cho, KiHoon Choi

Proceedings Volume 13216, 132161Y (2024) https://doi.org/10.1117/12.3034358

KEYWORDS: Critical dimension metrology, Laser development, Extreme ultraviolet, Photomasks, Deep ultraviolet, Quality management, Quality control, Wet etching, Transmittance, Reflection

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Proceedings Article | 22 November 2023 Presentation

Multi-column e-beam inspection system for advanced EUV reticles

Kunal Rohilla, David Aupperle, Wenxing Jiang, Seungtak Seo, Sanguk Park, Jongju Park, Jin Choi, Sanghee Lee, Min Choo, Yeonjeong Choi, Paul Chung

Proceedings Volume PC12750, PC127500E (2023) https://doi.org/10.1117/12.3007916

KEYWORDS: Inspection, Reticles, Extreme ultraviolet, Quality control, Manufacturing, Laser systems engineering, Laser manufacturing, Industry, Extreme ultraviolet lithography, Design and modelling

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Proceedings Article | 13 July 2017 Paper

MTO-like reference mask modeling for advanced inverse lithography technology patterns

Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo

Proceedings Volume 10454, 104540J (2017) https://doi.org/10.1117/12.2282406

KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing

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Proceedings Article | 28 July 2014 Paper

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park

Proceedings Volume 9256, 92560J (2014) https://doi.org/10.1117/12.2070303

KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

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