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Joseph A. Felker
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Author
Publications (4)
Proceedings Article | 25 June 1999 Paper
Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
Reginald Farrow, Warren Waskiewicz, Isik Kizilyalli, Gregg Gallatin, James Liddle, Masis Mkrtchyan, Avi Kornblit, Leonidas Ocola, Fred Klemens, Joseph Felker, Christopher Biddick, Joseph Kraus, Myrtle Blakey, Paul Orphanos, Nace Layadi, Sailesh Merchant
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351093
KEYWORDS: Charged-particle lithography, Semiconducting wafers, Optical alignment, Signal detection, Lithography, Photomasks, Signal to noise ratio, Electron beam lithography, CMOS sensors, Scanning electron microscopy
Proceedings Article | 25 June 1999 Paper
Writing strategy for a high-throughput SCALPEL system
Stuart Stanton, James Liddle, Joseph Felker, Warren Waskiewicz, Lloyd Harriott
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351091
KEYWORDS: Photomasks, Image segmentation, Charged-particle lithography, Semiconducting wafers, Optical alignment, Lithography, Wafer-level optics, Error analysis, Imaging systems, Distortion
Proceedings Article | 7 July 1997 Paper
SCALPEL proof-of-concept system: preliminary lithography results
Warren Waskiewicz, Christopher Biddick, Myrtle Blakey, Kevin Brady, Ron Camarda, Wayne Connelly, A. Crorken, J. Custy, R. DeMarco, Reginald Farrow, Joseph Felker, Linus Fetter, Richard Freeman, Lloyd Harriott, Leslie Hopkins, Harold Huggins, Richard Kasica, Chester Knurek, Joseph Kraus, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Len Rutberg, Harry Wade, Pat Watson, Kurt Werder, David Windt, Regine Tarascon-Auriol, Steven Berger, Stephen Bowler
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275786
KEYWORDS: Photomasks, Charged-particle lithography, Lithography, Printing, Semiconducting wafers, Etching, Silicon, Scanning electron microscopy, Photomicroscopy, Backscatter
Proceedings Article | 7 December 1994 Paper
SCALPEL system
Steven Berger, Christopher Biddick, Myrtle Blakey, Kevin Bolan, Stephen Bowler, Kevin Brady, Ron Camarda, Wayne Connelly, Reginald Farrow, Joseph Felker, Linus Fetter, Lloyd Harriott, Harold Huggins, Joseph Kraus, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Thomas Russell, Wayne Simpson, Regine Tarascon-Auriol, Harry Wade, Warren Waskiewicz, Pat Watson
Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195843
KEYWORDS: Charged-particle lithography, Photomasks, Semiconducting wafers, Electron beam lithography, Photomask technology, Charged particle optics, Wafer-level optics, Electron beams, Scattering, Lithography
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