Dr. Joy Y. Cheng Profile

Dr. Joy Y. Cheng

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author | Editor

Publications (20)

Proceedings Article | 13 March 2018 Paper

Nanoscale inhomogeneity and photoacid generation dynamics in extreme ultraviolet resist materials

Ping-Jui Wu, Yu-Fu Wang, Wei-Chi Chen, Chien-Wei Wang, Joy Cheng, Vencent Chang, Ching-Yu Chang, John Lin, Yuan-Chung Cheng

Proceedings Volume 10586, 105861O (2018) https://doi.org/10.1117/12.2316308

KEYWORDS: Extreme ultraviolet, Systems modeling, Monte Carlo methods, Polymers, Molecules, Oxygen, Diffusion, Chemical species, Extreme ultraviolet lithography, Ions

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The development of extreme ultraviolet (EUV) lithography towards the 22 nm node and beyond depends critically on the availability of resist materials that meet stringent control requirements in resolution, line edge roughness, and sensitivity. However, the molecular mechanisms that govern the structure-function relationships in current EUV resist systems are not well understood. In particular, the nanoscale structures of the polymer base and the distributions of photoacid generators (PAGs) should play a critical roles in the performance of a resist system, yet currently available models for photochemical reactions in EUV resist systems are exclusively based on homogeneous bulk models that ignore molecular-level details of solid resist films. In this work, we investigate how microscopic molecular organizations in EUV resist affect photoacid generations in a bottom-up approach that describes structure-dependent electron-transfer dynamics in a solid film model. To this end, molecular dynamics simulations and stimulated annealing are used to obtain structures of a large simulation box containing poly(4-hydroxystyrene) (PHS) base polymers and triphenylsulfonium based PAGs. Our calculations reveal that ion-pair interactions govern the microscopic distributions of the polymer base and PAG molecules, resulting in a highly inhomogeneous system with nonuniform nanoscale chemical domains. Furthermore, the theoretical structures were used in combination of quantum chemical calculations and the Marcus theory to evaluate electron transfer rates between molecular sites, and then kinetic Monte Carlo simulations were carried out to model electron transfer dynamics with molecular structure details taken into consideration. As a result, the portion of thermalized electrons that are absorbed by the PAGs and the nanoscale spatial distribution of generated acids can be estimated. Our data reveal that the nanoscale inhomogeneous distributions of base polymers and PAGs strongly affect the electron transfer and the performance of the resist system. The implications to the performances of EUV resists and key engineering requirements for improved resist systems will also be discussed in this work. Our results shed light on the fundamental structure dependence of photoacid generation and the control of the nanoscale structures as well as base polymer-PAG interactions in EVU resist systems, and we expect these knowledge will be useful for the future development of improved EUV resist systems.

Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory Doerk, Charles Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael Guillorn, Daniel Sanders

Proceedings Volume 9423, 942307 (2015) https://doi.org/10.1117/12.2086973

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, System on a chip, Scanning electron microscopy, Image segmentation, Photomasks, Etching, Electron beam lithography, Composites, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

HsinYu Tsai, Hiroyuki Miyazoe, Joy Cheng, Markus Brink, Simon Dawes, David Klaus, James Bucchignano, Daniel Sanders, Eric Joseph, Matthew Colburn, Michael Guillorn

Proceedings Volume 9423, 942314 (2015) https://doi.org/10.1117/12.2084845

KEYWORDS: Etching, Silicon, Photomasks, Line edge roughness, Polymethylmethacrylate, Tolerancing, Polymers, Optical lithography, Directed self assembly

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Proceedings Article | 31 March 2014 Paper

Computational lithography platform for 193i-guided directed self-assembly

Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Towards electrical testable SOI devices using Directed Self-Assembly for fin formation

Chi-Chun Liu, Cristina Estrada-Raygoza, Hong He, Michael Cicoria, Vinayak Rastogi, Nihar Mohanty, Hsinyu Tsai, Anthony Schepis, Kafai Lai, Robin Chao, Derrick Liu, Michael Guillorn, Jason Cantone, Sylvie Mignot, Ryoung-Han Kim, Joy Cheng, Melia Tjio, Akiteru Ko, David Hetzer, Mark Somervell, Matthew Colburn

Proceedings Volume 9049, 904909 (2014) https://doi.org/10.1117/12.2046462

KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

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SPIE Journal Paper | 25 September 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Lynne Gignac, James Bucchignano, David Klaus, Christopher Breslin, Eric Joseph, Joy Cheng, Daniel Sanders, Michael Guillorn, Chi-Chun Liu

JM3, Vol. 12, Issue 04, 041305, (September 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.041305

KEYWORDS: Etching, Optical lithography, Photomasks, Silicon, Carbon, Polymethylmethacrylate, Plasma, Metals, Line edge roughness, Directed self assembly

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Proceedings Article | 12 April 2013 Paper

Computational aspects of optical lithography extension by directed self-assembly

Kafai Lai, Chi-chun Liu, Jed Pitera, Daniel Dechene, Anthony Schepis, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Charles Rettner, Olalekan Odesanya, Melih Ozlem, Neal Lafferty

Proceedings Volume 8683, 868304 (2013) https://doi.org/10.1117/12.2012440

KEYWORDS: Photomasks, Optical lithography, Lithography, Optical proximity correction, Source mask optimization, 3D modeling, Extreme ultraviolet, Semiconducting wafers, Data modeling, Directed self assembly

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Proceedings Article | 29 March 2013 Paper

Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications

Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Sarunya Bangsaruntip, Isaac Lauer, Jim Bucchignano, Dave Klaus, Lynne Gignac, Eric Joseph, Joy Cheng, Dan Sanders, Michael Guillorn

Proceedings Volume 8685, 86850L (2013) https://doi.org/10.1117/12.2014259

KEYWORDS: Etching, Line edge roughness, Optical lithography, Silicon, Annealing, Polymethylmethacrylate, Photomasks, Electron beam lithography, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Directed self-assembly process implementation in a 300mm pilot line environment

Chi-Chun Liu, I. Cristina Estrada-Raygoza, Jassem Abdallah, Steven Holmes, Yunpeng Yin, Anthony Schepis, Michael Cicoria, David Hetzer, Hsinyu Tsai, Michael Guillorn, Melia Tjio, Joy Cheng, Mark Somervell, Matthew Colburn

Proceedings Volume 8680, 86801G (2013) https://doi.org/10.1117/12.2011610

KEYWORDS: Critical dimension metrology, Etching, Line width roughness, Semiconducting wafers, Optical lithography, Lithography, Chemical reactions, Photoresist processing, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Deterministically isolated gratings through the directed self-assembly of block copolymers

Gregory Doerk, Joy Cheng, Charles Rettner, Srinivasan Balakrishnan, Noel Arellano, Daniel Sanders

Proceedings Volume 8680, 86800Y (2013) https://doi.org/10.1117/12.2011629

KEYWORDS: Lithography, Epitaxy, Scanning electron microscopy, Custom fabrication, Polymers, Optical alignment, Polymethylmethacrylate, Etching, Oxygen, Directed self assembly

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Proceedings Article | 16 April 2012 Paper

Directed self-assembly defectivity assessment. Part II

Chris Bencher, He Yi, Jessica Zhou, Manping Cai, Jeffrey Smith, Liyan Miao, Ofir Montal, Shiran Blitshtein, Alon Lavi, Kfir Dotan, Huixiong Dai, Joy Cheng, Daniel Sanders, Melia Tjio, Steven Holmes

Proceedings Volume 8323, 83230N (2012) https://doi.org/10.1117/12.917993

KEYWORDS: Polymethylmethacrylate, Metrology, Image registration, Scanning electron microscopy, Inspection, Semiconducting wafers, Signal to noise ratio, Polymers, Optical lithography, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns

Gregory Doerk, Chi-Chun Liu, Joy Cheng, Charles Rettner, Jed Pitera, Leslie Krupp, Teya Topuria, Noel Arellano, Daniel Sanders

Proceedings Volume 8323, 83230P (2012) https://doi.org/10.1117/12.916421

KEYWORDS: Polymethylmethacrylate, Oxygen, Chemical analysis, Reactive ion etching, Polymers, Epitaxy, Etching, Error analysis, Lithography, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Chi-Chun Liu, Jed Pitera, Neal Lafferty, Kafai Lai, Charles Rettner, Melia Tjio, Noel Arellano, Joy Cheng

Proceedings Volume 8323, 83230X (2012) https://doi.org/10.1117/12.916525

KEYWORDS: Performance modeling, Monte Carlo methods, Optical proximity correction, Photomasks, Lithography, 3D modeling, Photoresist processing, Electron beam lithography, Double patterning technology, Directed self assembly

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Proceedings Article | 2 April 2011 Paper

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

Chris Bencher, Jeffrey Smith, Liyan Miao, Cathy Cai, Yongmei Chen, Joy Cheng, Daniel Sanders, Melia Tjio, Hoa Truong, Steven Holmes, William Hinsberg

Proceedings Volume 7970, 79700F (2011) https://doi.org/10.1117/12.881293

KEYWORDS: Semiconducting wafers, Optical lithography, Etching, Polymers, Lithography, Semiconductors, Inspection, Chemical vapor deposition, Silicon, Directed self assembly

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Proceedings Article | 1 April 2010 Paper

Self-assembling materials for lithographic patterning: overview, status, and moving forward

William Hinsberg, Joy Cheng, Ho-Cheol Kim, Daniel Sanders

Proceedings Volume 7637, 76370G (2010) https://doi.org/10.1117/12.852230

KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Image processing, Dry etching, Gold, Photomasks, Reactive ion etching, Directed self assembly

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Proceedings Article | 21 March 2008 Paper

Integration of polymer self-assembly for lithographic application

Joy Cheng, Daniel Sanders, Ho-Cheol Kim, Linda Sundberg

Proceedings Volume 6921, 692127 (2008) https://doi.org/10.1117/12.773247

KEYWORDS: Polymers, Lithography, Optical lithography, Thin films, Polymethylmethacrylate, Process control, Nanostructures, Platinum, Gold, Directed self assembly

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Proceedings Article | 20 March 2008 Paper

Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid

Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Ricardo Ruiz, Charles Black, Jed Pitera, Charles Rettner, Myron Flickner

Proceedings Volume 6921, 692129 (2008) https://doi.org/10.1117/12.772684

KEYWORDS: Photomicroscopy, Scanning electron microscopy, Silicon, Plasma etching, Picosecond phenomena, Coating, Oxides, Chromium, Lithography, Directed self assembly

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Proceedings Article | 20 March 2008 Paper

Device-oriented directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid

Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Charles Rettner

Proceedings Volume 6921, 69212B (2008) https://doi.org/10.1117/12.772723

KEYWORDS: Scanning electron microscopy, Photomicroscopy, Electron beam lithography, Picosecond phenomena, Oxides, Polymethylmethacrylate, Lithography, Ultraviolet radiation, Plasma etching, Directed self assembly

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Proceedings Article | 21 March 2007 Paper

Self-aligned, self-assembled organosilicate line patterns of ~20nm half-pitch from block-copolymer mediated self assembly

Ho-Cheol Kim, Joy Cheng, Charles Rettner, Oun-Ho Park, Robert Miller, Mark Hart, Linnea Sundström, Ying Zhang

Proceedings Volume 6519, 65191H (2007) https://doi.org/10.1117/12.711687

KEYWORDS: Silicon, Phase modulation, Scanning electron microscopy, Plasma etching, Natural surfaces, Transmission electron microscopy, Oxides, Etching, Thin films, Electron beam lithography

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