Juhwan Kim
Sr. Dir. of Advanced Technology Deployment at Siemens EDA
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659
KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

Proceedings Article | 20 March 2018 Presentation + Paper
Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park
Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638
KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

Proceedings Article | 13 March 2012 Paper
Minchul Oh, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Aasutosh Dave, John Sturtevant, Uwe Hollerbach, Thuy Do, Yuri Granik, Kostas Adam, Juhwan Kim, Cynthia Zhu, S. W. Jung
Proceedings Volume 8326, 83262R (2012) https://doi.org/10.1117/12.917984
KEYWORDS: Photomasks, Optical proximity correction, Oxides, Critical dimension metrology, Semiconducting wafers, Reflectivity, Calibration, Data modeling, Model-based design, Photoresist materials

Proceedings Article | 4 March 2010 Paper
Young-Seok Woo, Woon-Hyuk Choi, Beom-Seok Seo, Yoo-Hyon Kim, Vladislav Liubich, Shady Abdelwahed, Juhwan Kim, James Word, Jong-Won Lee
Proceedings Volume 7640, 76401F (2010) https://doi.org/10.1117/12.848447
KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Critical dimension metrology, Bridges, Resolution enhancement technologies, Semiconducting wafers, Lithographic illumination, Tolerancing, Computer simulations

Proceedings Article | 17 October 2008 Paper
Byung-Sung Kim, Yoo-Hyun Kim, Sung-Ho Lee, Sung-Il Kim, Sang-Rok Ha, Juhwan Kim, Alexander Tritchkov
Proceedings Volume 7122, 71220T (2008) https://doi.org/10.1117/12.801310
KEYWORDS: SRAF, Photomasks, Manufacturing, Optical proximity correction, Lithography, Photovoltaics, Semiconducting wafers, Double patterning technology, Image enhancement, Logic

Showing 5 of 13 publications
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