Dr. Jun Iwashita Profile

Dr. Jun Iwashita

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 1 April 2013 Paper

Deep ultraviolet out-of-band characterization of EUVL scanners and resists

Gian Lorusso, Tasaku Matsumiya, Jun Iwashita, Taku Hirayama, Eric Hendrickx

Proceedings Volume 8679, 86792V (2013) https://doi.org/10.1117/12.2011119

KEYWORDS: Deep ultraviolet, Photomasks, Aluminum, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Critical dimension metrology, Environmental monitoring

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Proceedings Article | 23 March 2012 Paper

Out-of-band insensitive polymer-bound PAG for EUV resist

Jun Iwashita, Taku Hirayama, Kensuke Matsuzawa, Yoshiyuki Utsumi, Katsumi Ohmori

Proceedings Volume 8322, 83220Y (2012) https://doi.org/10.1117/12.916355

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Absorption, Polymers, Extreme ultraviolet lithography, Lithography, Semiconducting wafers, Line width roughness, Diffusion, Lithographic illumination

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Proceedings Article | 16 April 2011 Paper

Characteristics of main chain decomposable STAR polymer for EUV resist

Jun Iwashita, Taku Hirayama, Isamu Takagi, Kensuke Matsuzawa, Kenta Suzuki, Sachiko Yoshizawa, Kenri Konno, Masahito Yahagi, Kazufumi Sato, Seiichi Tagawa, Kazuyuki Enomoto, Akihiro Oshima

Proceedings Volume 7972, 79720L (2011) https://doi.org/10.1117/12.879349

KEYWORDS: Polymers, Stars, Lithography, Diffusion, Floods, Semiconducting wafers, Extreme ultraviolet lithography, Polymer thin films, Image quality, Polymerization

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Proceedings Article | 30 March 2010 Paper

Characteristics of main chain decomposable star shaped polymer on EUV lithography

Taku Hirayama, Jun Iwashita, Sachiko Yoshizawa, Kenri Konno, Takeshi Iwai

Proceedings Volume 7639, 76390Q (2010) https://doi.org/10.1117/12.848439

KEYWORDS: Polymers, Stars, Lithography, Line width roughness, Polymer thin films, Extreme ultraviolet lithography, Diffusion, Semiconducting wafers, Nonlinear control, Lithographic illumination

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Proceedings Article | 1 April 2009 Paper

Main chain decomposible star shaped polymer for EUV resist

Jun Iwashita, Takeyoshi Mimura, Taku Hirayama, Takeshi Iwai

Proceedings Volume 7273, 72733O (2009) https://doi.org/10.1117/12.813990

KEYWORDS: Polymers, Stars, Diffusion, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Line width roughness, Polymerization, Semiconducting wafers, Polymer thin films

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Proceedings Article | 1 April 2009 Paper

Topcoat-free ArF negative tone resist

Tomoyuki Ando, Sho Abe, Ryoichi Takasu, Jun Iwashita, Shogo Matsumaru, Ryoji Watanabe, Komei Hirahara, Yujiro Suzuki, Miki Tsukano, Takeshi Iwai

Proceedings Volume 7273, 727308 (2009) https://doi.org/10.1117/12.813787

KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

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Proceedings Article | 4 December 2008 Paper

Pattern freezing process free litho-litho-etch double patterning

Tomoyuki Ando, Masaru Takeshita, Ryoich Takasu, Yasuhiro Yoshii, Jun Iwashita, Shogo Matsumaru, Sho Abe, Takeshi Iwai

Proceedings Volume 7140, 71402H (2008) https://doi.org/10.1117/12.804710

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

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Showing 5 of 7 publications

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