Mr. Junbo Liu Profile

Junbo Liu

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Proceedings Article | 9 January 2023 Paper

Absolute wavefront measurement of lithography projection lens using random averaging method

Qinglan Wang, Jianke Li, Haiyang Quan, Junbo Liu, Chuan Jin, Song Hu

Proceedings Volume 12507, 125072F (2023) https://doi.org/10.1117/12.2656462

KEYWORDS: Calibration, Spherical lenses, Wavefronts, Monochromatic aberrations, Optical spheres, Zemax, Measurement devices, Interferometers, Lithography, Glasses

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With the development of science and technology, the industry has an increasing demand for high-precision optical detection, such as wave aberration detection of the lithography objective lens, the core component of the lithography machine . System errors inevitably exist in the process of optical detection. Because the random averaging method has the characteristics of simple operation, this paper studies the system error calibration of the measuring device based on the random sphere method. Rotate the direction of the ball lens with a certain accuracy at random in the optical path, eliminate the random error in the measurement system and the uneven error of the spherical lens surface on average, and then subtract the inherent spherical aberration of the ball lens from the average measurement data to realize the measurement. Self-calibration of device systematic errors. The experimental platform for the verification of this method includes: a 632.8 nm light source, a 10 μm pinhole, a common lens, a spherical lens with a refractive index of 1.52 and a diameter of 40 mm, and a SID4 camera. After experimental verification, the method can realize the purpose of calibrating the system error of the measuring device with high precision and low cost by using a low-precision ball lens.

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