Image interpolation addresses the problem of obtaining high resolution (HR) images from its low resolution (LR) counterparts. For observed LR images with aliasing artifacts caused by undersampling, commonly used interpolation methods cannot recover HR images well, and may often interpolate over-fitting artifacts. In this paper, based on the observation that natural images normally have redundant similar patches, a new patch-synthesis-based interpolation method is proposed for image interpolation. In the proposed method, an inference method based on Markov chain is adopted to select the best patches from the input LR image and synthesize them into the undersampled areas of a desired HR image. In order to improve the efficiency of the algorithm, we also introduce fields of experts to model the sparse prior knowledge and use it to measure the compatibilities among neighboring patches. Experimental results compared with traditional interpolation methods demonstrate that our method cannot only alleviate the aliasing artifact, but also produce better results in terms of quantitative evaluation and subjective visual quality
Hydrophobic and hydrophilic films with titanium oxide inside were grown by radio frequency plasma enhanced
chemical vapor deposition (RF--PECVD) on glass substrates. Bias voltage was used as an assistant for the deposition
process. And a comparison was made between with and without the bias voltage. Titanium tetraisopropoxide (TTIP-Ti
(OC3H7)4) was used as the precursor compound. Film wettability was tested by water contact angle measurement
(CAM). The water contact angle (WAC) of the film deposited in plasma without biased voltage was greater than 145°,
while the WAC of the film deposited in plasma with biased voltage was less than 30°. The morphology of the deposited
films was observed by scanning electron microscope (SEM). It is found that the films grown without bias voltage were
covered with lots of nano grain and pores, but the surface of the films deposition with bias voltage was much dense. The
chemical structure and property of the deposited films were analyzed by Fourier-transformed infrared spectroscopy
(FTIR), while the plasma phase was investigated by optical emission spectroscopy (OES).
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