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Karim M. Moamen
IC Design Consultant at Siemens EDA
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Publications (1)
Proceedings Article | 19 May 2011 Paper
Elimination of lithographic hotspots which have been waived by means of pattern matching
Aditya Chaudhary, Pierre Bouchard, Kalpesh Dave, Tamer Desouky, Karim Moamen, Mark Simmons
Proceedings Volume 8081, 80810S (2011) https://doi.org/10.1117/12.897527
KEYWORDS: Databases, Optical proximity correction, Lithography, Semiconducting wafers, Silicon, Photomasks, Scanning electron microscopy, Visualization, Optical lithography, Nonlinear optics
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