Dr. Kaushal S. Patel Profile

Dr. Kaushal S. Patel

at IBM Microelectronics Div

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 29 March 2006 Paper

Silicon containing polymer in applications for 193-nm high-NA lithography processes

Sean Burns, Dirk Pfeiffer, Arpan Mahorowala, Karen Petrillo, Alexandera Clancy, Katherina Babich, David Medeiros, Scott Allen, Steven Holmes, Michael Crouse, Colin Brodsky, Victor Pham, Yi-Hsiung Lin, Kaushal Patel, Naftali Lustig, Allen Gabor, Christopher Sheraw, Phillip Brock, Carl Larson

Proceedings Volume 6153, 61530K (2006) https://doi.org/10.1117/12.657197

KEYWORDS: Silicon, Reflectivity, Etching, Photoresist materials, Polymers, Lithography, Oxides, Silicon films, Reactive ion etching, Optical lithography

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Proceedings Article | 29 March 2006 Paper

Reactive ion etching of fluorine containing photoresist

Kaushal Patel, Victor Pham, Wenjie Li, Mahmoud Khojasteh, Pushkara Rao Varanasi

Proceedings Volume 6153, 61530Q (2006) https://doi.org/10.1117/12.656605

KEYWORDS: Etching, Polymers, Fluorine, Photoresist materials, Chemical species, Oxygen, Data modeling, Reactive ion etching, Photomasks, Photoresist developing

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Proceedings Article | 29 March 2006 Paper

New 193-nm top antireflective coatings for superior swing reduction

Wu-Song Huang, William Heath, Ranee Kwong, Wenjie Li, Kaushal Patel, Pushkara Rao Varanasi

Proceedings Volume 6153, 61530S (2006) https://doi.org/10.1117/12.656641

KEYWORDS: Polymers, Reflectivity, Fluorine, Antireflective coatings, Semiconducting wafers, Critical dimension metrology, Destructive interference, Transmittance, Refractive index, 193nm lithography

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Proceedings Article | 14 March 2006 Paper

Meeting critical gate linewidth control needs at the 65 nm node

Arpan Mahorowala, Scott Halle, Allen Gabor, William Chu, Alexandra Barberet, Donald Samuels, Amr Abdo, Len Tsou, Wendy Yan, Seiji Iseda, Kaushal Patel, Bachir Dirahoui, Asuka Nomura, Ishtiaq Ahsan, Faisal Azam, Gary Berg, Andrew Brendler, Jeffrey Zimmerman, Tom Faure

Proceedings Volume 6156, 61560M (2006) https://doi.org/10.1117/12.659427

KEYWORDS: Critical dimension metrology, Etching, Semiconducting wafers, Photomasks, Optical proximity correction, Lithography, Cadmium, Reticles, Control systems, Immersion lithography

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Proceedings Article | 4 May 2005 Paper

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Pushkara Varanasi, Ranee Kwong, Mahmoud Khojasteh, Kaushal Patel, Kuang-Jung Chen, Wenjie Li, M. Lawson, Robert Allen, Ratnam Sooriyakumaran, P. Brock, Linda Sundberg, Mark Slezak, Gary Dabbagh, Z. Liu, Yukio Nishimura, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599700

KEYWORDS: Polymers, 193nm lithography, Lithography, Etching, Photoresist materials, Fluorine, Immersion lithography, Modulation, Photomasks, Reactive ion etching

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Proceedings Article | 4 May 2005 Paper

Progress toward developing high performance immersion compatible materials and processes

Karen Petrillo, Kaushal Patel, Rex Chen, Wenjie Li, Ranee Kwong, Peggy Lawson, Rao Varanasi, Chris Robinson, Steven Holmes, Dario Gil, Kurt Kimmel, Mark Slezak, Gary Dabbagh, Takashi Chiba, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601621

KEYWORDS: Polymers, Lithography, Immersion lithography, Materials processing, Semiconducting wafers, Particles, Photoresist materials, Image processing, Photoresist processing, Scanners

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Proceedings Article | 14 May 2004 Paper

IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance

Kaushal Patel, Margaret Lawson, Pushkara Rao Varanasi, David Medeiros, Gregory Wallraff, Phillip Brock, Richard DiPietro, Yukio Nishimura, Takashi Chiba, Mark Slezak

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536874

KEYWORDS: Polymers, Etching, Photoresist processing, Lithography, 193nm lithography, Printing, Oxides, Standards development, Resistance, Fluorine

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Proceedings Article | 14 May 2004 Paper

193-nm negative resist based on acid-catalyzed elimination of polar molecules

Ratnam Sooriyakumaran, Blake Davis, Carl Larson, Phillip Brock, Richard DiPietro, Thomas Wallow, Eric Connor, Linda Sundberg, Gregory Breyta, Robert Allen, Kaushal Patel, Pushkara Rao Varanasi

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536432

KEYWORDS: Polymers, Molecules, Switches, Standards development, Distortion, Photoresist materials, Lithography, Spectroscopy, Photomasks, Photoresist developing

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Proceedings Article | 12 June 2003 Paper

High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester functionalities

Mahmoud Khojasteh, K. Rex Chen, Ranee Kwong, Margaret Lawson, Pushkara Varanasi, Kaushal Patel, Eiichi Kobayashi

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485126

KEYWORDS: Polymers, Lithography, Photoresist materials, Polymerization, Photoresist processing, Manufacturing, Logic, Medium wave, Microelectronics, Resistance

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Showing 5 of 9 publications

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