Mr. Kazuaki Chiba Profile

Kazuaki Chiba

Engineer Photomask at Toppan Printing Co Ltd

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Author

Publications (13)

Proceedings Article | 11 May 2007 Paper

Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa

Proceedings Volume 6607, 66070C (2007) https://doi.org/10.1117/12.728925

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Printing, Etching, Binary data, Resolution enhancement technologies, Reflectivity, Scanning electron microscopy, Image enhancement

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Proceedings Article | 15 March 2006 Paper

Performance study of chromeless phase lithography mask for the 65nm node and beyond

Yosuke Kojima, Takashi Ohshima, Kazuaki Chiba, Toshio Konishi

Proceedings Volume 6154, 615428 (2006) https://doi.org/10.1117/12.656915

KEYWORDS: Nanoimprint lithography, Scattering, Phase shifts, Lithography, Photomasks, Resolution enhancement technologies, 193nm lithography, 3D image enhancement, Quartz, Electroluminescence

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Proceedings Article | 28 June 2005 Paper

Evaluation of quartz dry etching profile for the PSM lithography performance

Toru Komizo, Satoru Nemoto, Yosuke Kojima, Takashi Ohshima, Takashi Yoshii, Toshio Konishi, Kazuaki Chiba, Yasutaka Kikuchi, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617440

KEYWORDS: Quartz, Photomasks, Lithography, Etching, Semiconducting wafers, Dry etching, Phase shifts, Chromium, Scanning electron microscopy, Electromagnetism

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Proceedings Article | 20 August 2004 Paper

Study of alternating phase shift mask structures for ArF lithography

Yosuke Kojima, Toshio Konishi, Jun Sasaki, Keishi Tanaka, Toru Komizo, Motohiko Morita, Masanori Shirasaki, Takashi Ohshima, Hiroyuki Takahashi, Kazuaki Chiba, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557801

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Phase shifts, Lithography, Nanoimprint lithography, Printing, Logic devices, Light scattering, Semiconductors

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Proceedings Article | 17 December 2003 Paper

Study of alternating phase-shift mask structure for 65-nm node devices

Toshio Konishi, Tooru Komizo, Hiroyuki Takahashi, Motohiko Morita, Takashi Ohshima, Kazuaki Chiba, Yosuke Kojima, Jun Sasaki, Keishi Tanaka, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.522180

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Reticles, Phase shifts, 193nm lithography, Mask making, Semiconductors, Analytical research, Printing

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Proceedings Article | 11 March 2002 Paper

Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects

Kazuaki Chiba, Hiroyuki Takahashi, Wataru Nozaki, Shinji Akima, Susumu Nagashige, Yoshiro Yamada

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458319

KEYWORDS: Photomasks, Phase shifts, Inspection, Defect inspection, Critical dimension metrology, Defect detection, Process control, Reticles, Photomask technology, Control systems

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Proceedings Article | 30 December 1999 Paper

Detection and repair of multiphase defects on alternating phase-shift masks for DUV lithography

Susumu Nagashige, Kohki Hayashi, Shinji Akima, Hiroyuki Takahashi, Kazuaki Chiba, Yoshiro Yamada, Yuichi Matsuzawa

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373308

KEYWORDS: Inspection, Phase shifts, Quartz, Photomasks, Defect detection, Semiconducting wafers, Deep ultraviolet, Lithography, Atomic force microscopy, Etching

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Proceedings Article | 12 February 1997 Paper

Tritone PSM and its performance

Makoto Kohzuma, Kazuaki Chiba, Hiromasa Unno, Yasutaka Kikuchi, Yoshiro Yamada, Masao Otaki

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301197

KEYWORDS: Chromium, Semiconducting wafers, Photomasks, Halftones, Optical proximity correction, Reticles, Printing, Phase shifts, Opacity, Binary data

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Proceedings Article | 8 December 1995 Paper

Actual use of phase-shift mask

Yoshiro Yamada, Hiromasa Unno, Kazuaki Chiba, Eisei Karikawa, Yasutaka Kikuchi, Yusuke Hattori, Katsuhiro Kinemura

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228179

KEYWORDS: Chromium, Etching, Phase shifts, Dry etching, Manufacturing, Photomasks, Thin films, Reticles, Photoresist processing, Critical dimension metrology

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Proceedings Article | 3 July 1995 Paper

Quality control of embedded-type phase-shift mask

Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Hiromasa Unno, Yasutaka Kikuchi, Katsuhiro Kinemura, Masao Otaki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212785

KEYWORDS: Chromium, Phase shifts, Reticles, Photomasks, Dry etching, Inspection, Optical lithography, Critical dimension metrology, Coating, Control systems

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Proceedings Article | 7 December 1994 Paper

Toppan's work on phase-shift mask for 64MDRAM

Yoshiro Yamada, Kazuaki Chiba, Eisei Karikawa, Katsuhiro Kinemura, Masao Otaki

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195822

KEYWORDS: Photomasks, Phase shifts, Chromium, Photomask technology, Etching, Dry etching, Photoresist processing, Manufacturing, Optical lithography, Electroluminescence

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Proceedings Article | 30 June 1992 Paper

50-inch autostereoscopic full-color 3D TV display system

Haruo Isono, Minoru Yasuda, Daisuke Takemori, Hideyuki Kanayama, Chihiko Yamada, Kazuaki Chiba

Proceedings Volume 1669, (1992) https://doi.org/10.1117/12.60425

KEYWORDS: LCDs, Cameras, Video, Projection systems, Imaging systems, Displays, 3D displays, 3D image processing, Image display, Image resolution

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Proceedings Article | 1 November 1990 Paper

Magnetic and optical complex sensor unit

Kazuaki Chiba, Takao Kobayashi, Yuichi Obara, Hajime Mochizuki

Proceedings Volume 1338, (1990) https://doi.org/10.1117/12.22996

KEYWORDS: Sensors, Magnetism, Magnetic sensors, Head, Optical fibers, Reflectivity, Polymer optical fibers, Glasses, Optoelectronic devices, Light emitting diodes

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Showing 5 of 13 publications

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