Three experiments were carried out to investigate carbon deposition and its mitigation on the surface of Mo/Si multilayer
mirrors by EUV irradiation with the introduction of water vapor. In the first experiment of carbon deposition by EUV
irradiation in the presence of n-decane gas as a hydrocarbon source, the reflectivity dropping rate of the multilayer mirror
increases with increasing the n-decane pressure. In the second experiment of removing once-deposited carbon film by
introducing water vapor, the carbon film was partly removed by EUV irradiation in the presence of water vapor. In the
third experiment of carbon deposition mitigation by EUV irradiation in the coexistence of n-decane and water vapor, it
was observed that carbon film deposition was mitigated by controlling the water vapor pressure. However, the mitigation
effect on carbon deposition was not uniform for the EUV intensity, and a large non-linear dependency on the irradiation
flux was observed.
We investigated the protection of a Ru-capped Mo/Si multilayer from surface oxidation under exposure to EUV
radiation in the presence of water vapor and isopropyl alcohol (IPA). Degradation of the reflectance of the Ru-capped
Mo/Si multilayer by EUV irradiation was controlled by introducing IPA gas. We also investigated the reduction effect of
the oxide layer in a multilayer mirror by introducing ethanol and exposed EUV. The Ru-capped multilayer sample was
exposed to EUV radiation in the presence of only water vapor to oxidize its surface. The reflectance decreased by about
1.5%. Then the sample was exposed to EUV radiation in the presence of only ethanol vapor. The reflectivity of the
sample was recovered to +0.5%, and the atomic concentration of oxygen in the irradiated area was decreased by EUV
irradiation in the presence of ethanol.
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