Mr. Kenji Yoshida Profile

Kenji Yoshida

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 19 May 2008 Paper

Scanner fleet management utilizing programmed hotspot patterns

Kenji Yoshida, Soichi Inoue, Koji Hashimoto, Satoshi Tanaka, Masaki Satake, Takashi Obara, Kazuhiro Takahata, Eiji Yamanaka, Mitsuyo Kariya, Hiroyuki Morinaga, Shoji Mimotogi

Proceedings Volume 7028, 70280W (2008) https://doi.org/10.1117/12.793038

KEYWORDS: Scanners, Photomasks, Semiconducting wafers, Inspection, Lithography, Data acquisition, Infrared imaging, Reliability, Lithographic illumination, Optical proximity correction

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Hotspot management in which mask fabrication errors are considered

Mitsuyo Kariya, Eiji Yamanaka, Kenji Yoshida, Kenji Konomi, Masaki Satake, Satoshi Tanaka

Proceedings Volume 7028, 70282U (2008) https://doi.org/10.1117/12.793100

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Mask making, Error analysis, Feature extraction, Semiconducting wafers, Quality systems, Inspection, Computer aided design

Read Abstract +

Proceedings Article | 1 April 2008 Paper

Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kenji Yoshida, Hideki Kanai, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Katsura Miyashita, Soichi Inoue

Proceedings Volume 6924, 69240M (2008) https://doi.org/10.1117/12.772201

KEYWORDS: Lithography, Optical lithography, Scanners, SRAF, Semiconducting wafers, Lithographic illumination, Metals, Photomasks, Semiconductors, Logic devices

Read Abstract +

Proceedings Article | 19 March 2008 Paper

Hot spot management with die-to-database wafer inspection system

Kohji Hashimoto, Satoshi Usui, Kenji Yoshida, Ichirota Nagahama, Osamu Nagano, Yasuo Matsuoka, Yuuichiro Yamazaki, Soichi Inoue

Proceedings Volume 6925, 692517 (2008) https://doi.org/10.1117/12.772563

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Optical lithography, Metals, Optical inspection, Wafer inspection, Lithography, Optical proximity correction, CMOS devices

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Virtual lithography system to improve the productivity of high-mix low-volume production

Kenji Yoshida, Takashi Sato, Takuya Kono, Eiji Yamanaka, Mitsuyo Kariya, Arata Inoue, Shoji Mimotogi

Proceedings Volume 6607, 66071J (2007) https://doi.org/10.1117/12.728966

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Critical dimension metrology, Data modeling, Manufacturing, Calibration, Reliability, Optical lithography, Virtual reality

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years