Dr. Kenneth C. Racette Profile

Dr. Kenneth C. Racette

Advisory Engineer at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (26)

Proceedings Article | 11 May 2009 Paper

Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount

Takashi Mizoguchi, Satoshi Akutagawa, Monica Barrett, Michael Caterer, Robert Nolan, Kenneth Racette, Dennis Plouffe, Nancy Zhou

Proceedings Volume 7379, 73791R (2009) https://doi.org/10.1117/12.824303

KEYWORDS: Pellicles, Photomasks, Distortion, Quartz, Adhesives, Chromium, Current controlled current source, Lithium, Phase shifts

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Proceedings Article | 11 May 2009 Paper

Effect of pellicle frame and adhesive material on final photomask flatness

Nancy Zhou, Ken Racette, David Hasselbeck, Monica Barrett, Robert Nolan, Michael Caterer, Takashi Mizoguchi, Satoshi Akutagawa, Glenn Dickey, Toru Shirasaki

Proceedings Volume 7379, 737909 (2009) https://doi.org/10.1117/12.824250

KEYWORDS: Pellicles, Adhesives, Aluminum, Photomasks, Polymers, Distortion, Manufacturing, Optical lithography, Switching, Cobalt

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Proceedings Article | 17 October 2008 Paper

Evaluation of 32nm advanced immersion lithography pellicles

N. Zhou, K. Racette, M. Hibbs, T. Mizoguchi, D. Hasselbeck, M. Barrett, R. Nolan, F. Houle, J. Ritter, A. Wagner, M. Caterer

Proceedings Volume 7122, 71220B (2008) https://doi.org/10.1117/12.801663

KEYWORDS: Pellicles, Photomasks, Adhesives, Data modeling, Inspection, Distortion, Transmittance, Immersion lithography, Lenses, Fermium

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Proceedings Article | 17 October 2008 Paper

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Thomas Faure, Emily Gallagher, Michael Hibbs, Louis Kindt, Ken Racette, Richard Wistrom, Amy Zweber, Alfred Wagner, Yasutaka Kikuchi, Toru Komizo, Satoru Nemoto

Proceedings Volume 7122, 712209 (2008) https://doi.org/10.1117/12.801950

KEYWORDS: Photomasks, Binary data, Opacity, Chromium, Etching, Photoresist processing, Critical dimension metrology, Quartz, Phase shifts, Mask making

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Proceedings Article | 30 October 2007 Paper

Development and characterization of a new low stress molybdenum silicide film for 45 nm attenuated phase-shift mask manufacturing

Thomas Faure, Emily Gallagher, Louis Kindt, Steven Nash, Ken Racette, Richard Wistrom, Toru Komizo, Yasutaka Kikuchi, Satoru Nemoto, Yushin Sasaki, Atsushi Kominato, Toshiyuki Suzuki

Proceedings Volume 6730, 67300C (2007) https://doi.org/10.1117/12.748664

KEYWORDS: Photomasks, Etching, Distortion, Manufacturing, Line edge roughness, Photoresist processing, Dry etching, Image processing, Transmittance, Opacity

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Proceedings Article | 14 May 2007 Paper

Pellicle factors affecting finished photomask flatness

K. Racette, A. Watts, M. Barrett, R. Nolan, Y. Sasaki, Y. Kikuchi, T. Matsumura

Proceedings Volume 6607, 66071V (2007) https://doi.org/10.1117/12.728978

KEYWORDS: Pellicles, Photomasks, Adhesives, Distortion, Platinum, Manufacturing, Optical lithography, Optics manufacturing, Electronics, Printing

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Proceedings Article | 26 March 2007 Paper

Optical error sensitivities of immersion lithography

Zheng Chen, Kafai Lai, Ken Racette

Proceedings Volume 6520, 652013 (2007) https://doi.org/10.1117/12.712333

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Error analysis, Imaging systems, Immersion lithography, Optical proximity correction, Finite element methods, Diffraction, Monochromatic aberrations

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Proceedings Article | 20 May 2006 Paper

Influence of the pellicle on final photomask flatness

Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, Andrew Watts

Proceedings Volume 6283, 628326 (2006) https://doi.org/10.1117/12.681775

KEYWORDS: Pellicles, Photomasks, Adhesives, Distortion, Manufacturing, Optics manufacturing, Optical lithography, Lithography, Optical mounts, Reticles

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Proceedings Article | 8 November 2005 Paper

Investigation of shipping material and reticle storage environment to dark loss stability of chemically amplified resist

Christina Deverich, Paul Rabidoux, Ken Racette

Proceedings Volume 5992, 59923C (2005) https://doi.org/10.1117/12.632223

KEYWORDS: FT-IR spectroscopy, Nitrogen, Chemically amplified resists, Contamination, Chemical analysis, Compact discs, Chlorine, Photomasks, Reticles, Control systems

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Proceedings Article | 5 November 2005 Paper

Post coat delay effects on chemically amplified resists and storage condition impacts

Daniel Sullivan, Kenneth Racette, Monica Barrett, R. Brian Couture

Proceedings Volume 5992, 59920L (2005) https://doi.org/10.1117/12.631949

KEYWORDS: Thin film coatings, Critical dimension metrology, Compact discs, Chemically amplified resists, Photoresist materials, Opacity, Chromium, Standards development, Nitrogen, Quartz

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Proceedings Article | 28 June 2005 Paper

Investigation of pellicle influence on reticle flatness

Christopher Lee, Kenneth Racette, Monica Barrett

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617120

KEYWORDS: Pellicles, Photomasks, Reticles, Lithography, Semiconducting wafers, 3D modeling, Lithographic illumination, Polishing, Surface finishing, Optical mounts

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Proceedings Article | 10 May 2005 Paper

The effect of mask substrate and mask process steps on patterned photomask flatness

Kenneth Racette, Monica Barrett, Michael Hibbs, Max Levy

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599598

KEYWORDS: Photomasks, Pellicles, Chromium, Quartz, Optical lithography, Coating, Polishing, Aluminum, Lithography, Image processing

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Proceedings Article | 16 June 2003 Paper

Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks

Carey Thiel, Kenneth Racette, Emily Fisch, Mark Lawliss, Louis Kindt, Chester Huang, Robin Ackel, Max Levy

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484988

KEYWORDS: Chromium, Etching, Reflectivity, Oxides, Photomasks, Extreme ultraviolet lithography, Dry etching, Multilayers, Wet etching, Silicon

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Proceedings Article | 27 December 2002 Paper

Low-defect EUVL multilayers on standard-format mask blanks

James Folta, Patrick Kearney, Cindy Larson, Michael Crosley, Emily Fisch, Kenneth Racette

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467478

KEYWORDS: Photomasks, Semiconducting wafers, Coating, Multilayers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Silicon, Defect inspection, Standards development

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Proceedings Article | 27 December 2002 Paper

Mask blanks and their (sometimes invisible) defects

Emily Fisch, Kenneth Racette, James Folta, Cindy Larson

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467481

KEYWORDS: Photomasks, Inspection, Quartz, Particles, Extreme ultraviolet lithography, Chromium, Lithography, Multilayers, Reticles, Microelectronics

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Proceedings Article | 16 August 2002 Paper

Mask availability for next-generation lithography

Michael Lercel, Emily Fisch, Kenneth Racette, Mark Lawliss, Carey Williams, Louis Kindt, Chester Huang

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479342

KEYWORDS: Photomasks, Inspection, Lithography, Extreme ultraviolet lithography, X-rays, Etching, Chromium, Image processing, Multilayers, Reflectivity

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Proceedings Article | 1 August 2002 Paper

EUVL mask fabrication for the 45-nm node

Emily Fisch, Louis Kindt, Michael Lercel, Kenneth Racette, Carey Williams

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476989

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reflectivity, Chromium, Inspection, Particles, Silica, Silicon, Extreme ultraviolet, Oxides

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Proceedings Article | 1 July 2002 Paper

Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

Kenneth Racette, Carey Williams, Emily Fisch, Louis Kindt, Mark Lawliss, Robin Ackel, Michael Lercel

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472286

KEYWORDS: Chromium, Extreme ultraviolet lithography, Etching, Photomasks, Inspection, Line edge roughness, Silicon, Metrology, Reflectivity, Quartz

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Proceedings Article | 11 March 2002 Paper

Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks

Kenneth Racette, Carey Williams, Michael Lercel

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458253

KEYWORDS: Chromium, Etching, Extreme ultraviolet lithography, Photomasks, Silicon, Tantalum, Semiconducting wafers, Oxides, Silicon films, Argon

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Proceedings Article | 14 September 2001 Paper

Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications

S. Chey, Charles Guarnieri, Katherina Babich, Keith Pope, Dario Goldfarb, Marie Angelopoulos, Kenneth Racette, Michael Hibbs, Margaret Gibson, Kurt Kimmel

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435779

KEYWORDS: Composites, Thin films, Photomasks, Phase shifts, Etching, Manufacturing, Dry etching, Oxygen, Transmittance, Metals

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Proceedings Article | 20 August 2001 Paper

Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks

Christopher Magg, Michael Lercel, Mark Lawliss, Robin Ackel, Neal Caldwell, Louis Kindt, Kenneth Racette, Carey Williams, Phillip Reu

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436664

KEYWORDS: Photomasks, Image processing, Electron beam lithography, Projection lithography, Silicon, Scattering, Etching, Lithography, Finite element methods, Image analysis

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Proceedings Article | 19 July 2000 Paper

Next-generation lithography mask development at the NGL-MCOC

Michael Lercel, Kenneth Racette, Christopher Magg, Mark Lawliss, Kevin Collins, Monica Barrett, Michael Trybendis, Lucien Bouchard

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392049

KEYWORDS: Photomasks, Etching, X-rays, Image processing, Silicon, Scattering, Photoresist processing, Lithography, Diamond, Extreme ultraviolet lithography

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Proceedings Article | 30 December 1999 Paper

Next-generation lithography mask development at the NGL Mask Center of Competency

Michael Lercel, Cameron Brooks, Kenneth Racette, Christopher Magg, Mark Lawliss, Neal Caldwell, Raymond Jeffer, Kevin Collins, Monica Barrett, Steven Nash, Michael Trybendis, Lucien Bouchard

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373374

KEYWORDS: Photomasks, X-rays, Critical dimension metrology, Etching, Semiconducting wafers, Electron beam lithography, Silicon, Lithography, X-ray lithography, Extreme ultraviolet

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