In this study, rA is investigated by different growth temperature between from 1200℃ to 1650℃ during AlN growth by high temperature metalorganic vapor phase epitaxy (MOVPE). The value of dislocation density calculated by X-ray rocking curve (XRC) fullwidth at half-maximum (FWHM) is decreasing with increasing AlN layer thickness. Moreover, it is found that there is threshold value in rA at the temperature of 1400℃. As a result, rA value is observed 20.2 nm in AlN with growth temperature of 1650℃, this represents close to rA value (27.5 nm) in GaN.
Highly reflective reflector (> 99.9%) operating at deep ultraviolet (DUV) wavelength region around 244 nm was
proposed by using subwavelength grating (SWG) patterned AlN substrate. Structural parameters of AlN-SWG were
desgined for DUV reflector using the wavenumber dispersion relation of the eiegenmdoes resulting from its periodic
refractive index distribution. The electromagnetic field calculated by finite-difference time-domain (FDTD) method
revealed the polarization selective reflection characteristics of the designed AlN-SWG, and the SWG can achieve more
than 99% reflectivity of p-polarization (the electric field is perpendicular to the grating fingers) at the DUV wavelength of
244 nm. This extremely high reflectivity, polarization selectivity and compactness of our AlN-SWG are very useful for
various DUV applications, such as cavity of DUV laser diodes.
We report on design and lasing characteristics of GaN vertical-cavity surface-emitting lasers (VCSELs) with an
elongated cavity for use in uniform elements of a two-dimensional (2D) laser array. Calculations of VCSELs with the
elongated cavity taking into account the wavelength dispersion of the refractive index show that the transverse mode
spacing can be significantly narrower than the gain spectrum with a small tradeoff of the differential quantum efficiency.
The result clearly shows that the elongated cavity is robust against the thermally induced peakshift of the gain spectrum,
and thus preferable for use in elements of density packed laser array for which uniform operation of each element is
crucial. The VCSEL with the elongated cavity fabricated by the wafer thinning technique operates under current
injection by using highly reflective distributed Bragg reflectors (DBRs) made of transparent ZrO2 and SiO2 film stacks. Together with high reflectivity and wide stop band of the DBR, the elongated cavity of 6 μm (36λ) allows multimode lasing oscillation with a mode spacing of 2.9 nm, which is one order of magnitude narrower than the gain spectrum. In addition, we demonstrate a 5x5 GaN VCSEL array.
Increased-pressure metalorganic vapor phase epitaxy (MOVPE) system with high speed switching valves is found to
be effective for growing In-rich GaInN at a high temperature. High-speed switching valves enable the atomic layer
epitaxy of high quality AlGaN at a low temperature, by which we can grow thin AlGaN capping layer without the
thermal decomposition of underlying In-rich GaInN. This new growth technology sheds light on the digital alloy growth
for the development of high-efficiency nitride-based visible long -wavelength light emitters.
A microstructure in AlGaN with a whole compositional range on an AlN/sapphire template is systematically investigated.
At the interface between AlGaN and AlN, misfit dislocation density increases with Ga composition in AlGaN. However,
most misfit dislocations bend owing to the compressive stress and form loops, by which threading dislocation density is
markedly reduced if the thickness exceeds several microns. The effective acceptor energy of Mg in Al0.5Ga0.5N is found
to depend on Mg concentration with a negative one-third power. A SiO2/AlN dielectric multilayer mirror is very
effective for controlling the reflectivity of the Fabry-Perot resonator mirrors at the cleaved edge of the ultraviolet (UV)
laser diodes (LDs). A UV LD with an emission wavelength of 358 nm shows a threshold current density as low as 3.9
KA/cm2 at room temperature.
In attempt to prepare a high performance AlxGa1-xN based UV-B LED, a computer simulation has been performed on
a typical UV-LED structure to find out the effect of threading dislocations on non-radiative recombination process. UVB
LED structures were formed on using GaN and AlN based layers for comparison. Cracks were generated in the device
structure formed on GaN underlayer. No cracks were observed on the device structure formed on AlN under layer.
Much better structure was formed when the base AlN was grown by high temperature MOVPE.
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