Gold nanoparticles (AuNPs) were the basis for the earliest research in the field of surface enhanced Raman scattering (SERS). Coupling of their surface plasmon resonances creates hot-spots of high electromagnetic intensities found to be very useful for sensing applications. However, chemically synthesized AuNPs in suspension are usually polydisperse and when arranged on a SERS substrate, lack periodic spatial organization. This leads to large variations in the enhancement factor (EF) which is detrimental to the sensing capabilities of the SERS substrate. Here, we showcase reproducible fabrication of an array of spherical AuNPs at the apices of shell isolated silicon nanocones with a homogeneous EF for SERS. The AuNPs are produced through discrete rotation glancing angle deposition of Au on shell isolated silicon nanocones (SI-SiNC) with square lattice periodicity and 250 nm pitch. By tuning the substrate tilt angle, substrate rotation angle and deposition thickness, the location and the size of the AuNPs formed can be controlled. Using this method, we successfully fabricated 60 nm AuNPs positioned at the apices of the nanocone array. Finite-Difference Time-Domain (FDTD) simulations were performed to visualize the electric field enhancement and verify conditions such as tip radius and oxide shell thickness to optimize the same. The EF was then experimentally calculated by performing SERS measurements on benzenethiol (BT) functionalized AuNPs at 400 unique points over the SI-SiNC substrate and compared to measurements of pure BT solution. A homogeneous substrate EF of (2.05 ± 0.05) ∙107 (99% confidence interval) at par with literature was calculated for the C-S in-plane deformation mode, δCS, of the BT molecule excited at 1077 cm-1. Our work highlights the advantages of nanofabrication for homogeneous SERS EF substrates.
This work reports the fabrication of large-area Au nanoantennas, tuned to 1400cm-1 , on a Si substrate for surfaceenhanced- infrared-absorption-spectroscopy. Two different kinds of nanoantennas are fabricated, namely nano-rods and nano-slits. Fabrication is achieved by E-beam lithography (EBL). The need for an adhesion layer is eliminated using our previously reported UV-ozone pre-treatment1. To our knowledge, this is the first time this technique is used to fabricate Au nanoantennas on Si without the need adhesion layer, while at the same time obtaining a strong adhesion. This UVozone treatment does not only speed up the fabrication process, it can potentially increase the enhancement quality due to the negative influence metallic adhesion layers can have on the plasmon resonance of Au nanoantennas2–4. Next to using the standard positive resist for EBL lithography, we also propose a workflow using a negative photoresist to make the nano-rod antennas, potentially speeding up the process by skipping the lift off procedure. Although the negative photoresist fabrication process still requires optimization, our first fabrication attempt show promising results. In order to get the optimal enhancement for a given wavelength, we used FTDT simulations to simulate the structure length, height, width and pitch. After successful simulations, the structures were fabricated and a comparison between the simulated results and fabricated structures was made, confirming the simulation results.
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