Mr. Kevin Seguin Profile

Kevin Seguin

at Donaldson Co Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 24 March 2008 Paper

Rationalizing the mechanism of HMDS degradation in air and effective control of the reaction byproducts

Kevin Seguin, Andrew Dallas, Gerald Weineck

Proceedings Volume 6922, 692230 (2008) https://doi.org/10.1117/12.772998

KEYWORDS: Head-mounted displays, Carbon, FT-IR spectroscopy, Humidity, Contamination, Adsorption, Calibration, Semiconducting wafers, Lithography, Absorbance

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Proceedings Article | 5 April 2007 Paper

Low-pressure drop filtration of airborne molecular organic contaminants using open-channel networks

Andrew Dallas, Jon Joriman, Lefei Ding, Gerald Weineck, Kevin Seguin

Proceedings Volume 6518, 651846 (2007) https://doi.org/10.1117/12.708302

KEYWORDS: Carbon, Silicon, Head-mounted displays, Adsorption, Fluctuations and noise, Chemistry, Contamination, Semiconductor manufacturing, Humidity, Silicon carbide

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Proceedings Article | 24 March 2006 Paper

An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)

Andrew Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Kevin Seguin, Dustin Zastera

Proceedings Volume 6152, 61523R (2006) https://doi.org/10.1117/12.654839

KEYWORDS: Adsorption, Carbon, Ions, Statistical analysis, FT-IR spectroscopy, Hydrogen, Natural surfaces, Semiconductors, Ion exchange, Humidity

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Proceedings Article | 10 May 2005 Paper

Removal of low concentrations of acid gases: issues and solutions

Andrew Dallas, Lefei Ding, Jeremy Exley, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin, Dustin Zastera

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599815

KEYWORDS: Gases, Carbon, Humidity, Sensors, Contamination, Lithography, Network architectures, Fluctuations and noise, Ions, Industrial chemicals

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Proceedings Article | 24 May 2004 Paper

Are ambient SO2 levels a valid indicator of projected acid gas filter life?

Andrew Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Jonathan Parsons, Kevin Seguin

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534102

KEYWORDS: Gases, Chemical analysis, Manufacturing, Carbon, Industrial chemicals, Oxides, Nitrogen, Adsorption, Ions, Sulfur

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Proceedings Article | 26 June 2003 Paper

New concerns with the design of filters for the protection of lithography optics

Andrew Dallas, William Ding, Brian Hoang, Jon Joriman, Jonathan Parsons, Kevin Seguin

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485416

KEYWORDS: Directed energy weapons, Humidity, Sulfur, Contamination, Optical filters, Sensors, Manufacturing, Adsorption, Semiconducting wafers, Lithography

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Showing 5 of 6 publications

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