Dr. Kiwamu Takehisa Profile

Dr. Kiwamu Takehisa

Senior Scientist at O2 Laser Laboratory

SPIE Involvement:

Author | Editor

Publications (26)

Proceedings Article | 12 November 2024 Poster + Paper

The two-mask stage scanner for High-NA EUV lithography

Kiwamu Takehisa

Proceedings Volume 13215, 132150U (2024) https://doi.org/10.1117/12.3033265

KEYWORDS: Switching, Optical alignment, Laser scanners, Oxygen, Lithographic illumination, Light sources and illumination

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Proceedings Article | 26 August 2024 Paper

Throughput simulations of the two-mask stage for high-NA EUV scanners

Kiwamu Takehisa

Proceedings Volume 13177, 131770H (2024) https://doi.org/10.1117/12.3031845

KEYWORDS: Scanners, Photomasks, Semiconducting wafers, Simulations, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Poster + Paper

An idea of two-mask stage for high-NA EUV scanners

Kiwamu Takehisa

Proceedings Volume 12953, 129531C (2024) https://doi.org/10.1117/12.3011965

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Extreme ultraviolet

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Proceedings Article | 9 April 2020 Paper

Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Anna Tchikoulaeva, Hiroki Miyai, Tsunehito Kohyama, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11323, 113231K (2020) https://doi.org/10.1117/12.2557858

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Defect detection, High volume manufacturing, Particles, Pellicles, Deep ultraviolet

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Proceedings Article | 25 November 2019 Open Access

Actinic patterned mask defect inspection for EUV lithography

Hiroki Miyai, Tsunehito Kohyama, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 11148, 111480W (2019) https://doi.org/10.1117/12.2538001

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Defect inspection, Deep ultraviolet, Defect detection, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Image resolution

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Proceedings Article | 7 October 2019 Paper

Anti-satellite capability of a chemical oxygen-iodine laser in a high-altitude airship

K. Takehisa

Proceedings Volume 11162, 1116201 (2019) https://doi.org/10.1117/12.2524683

KEYWORDS: Satellites, Chemical lasers, Atmospheric propagation, Space based lasers, Optical simulations, Defense systems

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Proceedings Article | 9 October 2018 Presentation + Paper

New defence system using a chemical oxygen-iodine laser in a high-altitude airship

K. Takehisa

Proceedings Volume 10798, 1079803 (2018) https://doi.org/10.1117/12.2318141

KEYWORDS: Chemical oxygen iodine lasers, Missiles, Defense systems, Chemical lasers, Mirrors, Laser resonators, Laser missile defense, Atmospheric propagation, Oxygen, Helium

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Proceedings Article | 21 October 2016 Paper

Conceptual design of a space-based O2 laser for defense system

K. Takehisa

Proceedings Volume 9990, 99900E (2016) https://doi.org/10.1117/12.2238869

KEYWORDS: Chemical lasers, Oxygen, Mirrors, Space based lasers, Laser energy, Laser beam propagation, Missiles, Defense systems, Atmospheric propagation, Absorption

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SPIE Journal Paper | 31 March 2016 Open Access

Special Section Guest Editorial:Photomask Manufacturing Technology

Masato Shibuya, Morihisa Hoga, Kiwamu Takehisa

JM3, Vol. 15, Issue 02, 021001, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021001

KEYWORDS: Photomasks, Manufacturing, Optical lithography, Nanoimprint lithography, Optical proximity correction, Nanotechnology, Printing, Semiconductor lasers, Semiconductors, Extreme ultraviolet

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Proceedings Article | 18 March 2016 Paper

Advances in the detection capability on actinic blank inspection

Takeshi Yamane, Tsuyoshi Amano, Noriaki Takagi, Hidehiro Watanabe, Ichro Mori, Tomohisa Ino, Tomohiro Suzuki, Kiwamu Takehisa, Hiroki Miyai, Haruhiko Kusunose

Proceedings Volume 9776, 97761G (2016) https://doi.org/10.1117/12.2222747

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Light scattering, Multilayers, Defect detection, Extreme ultraviolet, Semiconducting wafers, Lithographic illumination, Mirrors, EUV optics, CCD cameras

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Proceedings Article | 27 October 2015 Paper

Considerations of a ship defense with a pulsed COIL

K. Takehisa

Proceedings Volume 9650, 965003 (2015) https://doi.org/10.1117/12.2197523

KEYWORDS: Amplifiers, Optical amplifiers, Chemical oxygen iodine lasers, Defense and security, Chemical lasers, Oxygen, Missiles, Pulsed laser operation, Directed energy weapons, Chlorine

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Proceedings Article | 9 July 2015 Paper

Detection capability of Actinic Blank Inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 9658, 96580O (2015) https://doi.org/10.1117/12.2197309

KEYWORDS: Inspection, Mirrors, Lithographic illumination, Extreme ultraviolet, Defect detection, Photomasks, Ray tracing, Data modeling, Extreme ultraviolet lithography, High volume manufacturing

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Proceedings Article | 20 May 2015 Paper

Proposal of a defense application for a chemical oxygen laser

K. Takehisa

Proceedings Volume 9466, 94660W (2015) https://doi.org/10.1117/12.2178011

KEYWORDS: Mirrors, Chemical lasers, Oxygen, Directed energy weapons, Chemical oxygen iodine lasers, Oscillators, Pulsed laser operation, Defense systems, Missiles

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Proceedings Article | 7 October 2014 Paper

New concepts of realizing a chemical oxygen laser

K. Takehisa

Proceedings Volume 9251, 92510X (2014) https://doi.org/10.1117/12.2069708

KEYWORDS: Oxygen, Q switching, Mirrors, Chemical lasers, Oscillators, Chemical oxygen iodine lasers, Laser resonators, Laser energy, Reflectivity, Absorption

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Proceedings Article | 28 July 2014 Paper

Performance in practical use of actinic EUVL mask blank inspection

Takeshi Yamane, Yongdae Kim, Noriaki Takagi, Tsuneo Terasawa, Tomohisa Ino, Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose

Proceedings Volume 9256, 92560P (2014) https://doi.org/10.1117/12.2067566

KEYWORDS: Photomasks, Inspection, Surface roughness, Prototyping, Semiconducting wafers, Defect detection, Critical dimension metrology, Extreme ultraviolet lithography, Light scattering, CCD cameras

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Proceedings Article | 28 July 2014 Paper

Defect analysis on actinic blank inspection tool

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 9256, 92560O (2014) https://doi.org/10.1117/12.2069197

KEYWORDS: Inspection, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Image classification, Mirrors, Geometrical optics, Ray tracing, Lithography, Manufacturing

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Proceedings Article | 28 June 2013 Paper

EUV scanner throughput considerations for the higher mask magnification

Kiwamu Takehisa

Proceedings Volume 8701, 87010T (2013) https://doi.org/10.1117/12.2025362

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reticles, Scanners, Extreme ultraviolet, Mirrors, Laser scanners, 3D scanning, Line width roughness

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Proceedings Article | 28 June 2013 Paper

The capability of high magnification review function for EUV actinic blank inspection tool

Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Ichiro Mori

Proceedings Volume 8701, 870118 (2013) https://doi.org/10.1117/12.2030712

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Charge-coupled devices, Defect detection, Multilayers, Switches, Ions

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Proceedings Article | 1 April 2013 Paper

EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proceedings Volume 8679, 86790I (2013) https://doi.org/10.1117/12.2011776

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Defect inspection, Prototyping, Extreme ultraviolet lithography, Defect detection, High volume manufacturing, Metrology, Mirrors

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Proceedings Article | 30 June 2012 Paper

EUV actinic blank inspection tool with a high magnification review mode

Tomohiro Suzuki, Hiroki Miyai, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Proceedings Volume 8441, 844115 (2012) https://doi.org/10.1117/12.964983

KEYWORDS: Inspection, Mirrors, Extreme ultraviolet, Switches, EUV optics, Photomasks, Charge-coupled devices, Cameras, Extreme ultraviolet lithography, Electroluminescent displays

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Proceedings Article | 11 May 2009 Paper

Phase-shift/transmittance measurements in a micro pattern using MPM193EX

Hiroto Nozawa, Takayuki Ishida, Satoru Kato, Osamu Sato, Koji Miyazaki, Kiwamu Takehisa, Naoki Awamura, Hideo Takizawa, Hal Kusunose

Proceedings Volume 7379, 737925 (2009) https://doi.org/10.1117/12.824318

KEYWORDS: Phase measurement, Transmittance, Photomasks, Signal detection, Lithography, Distance measurement, Interferometers, Image processing, Charge-coupled devices, Objectives

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Proceedings Article | 4 December 2008 Paper

The limit to 4X EUVL

Kiwamu Takehisa

Proceedings Volume 7140, 71403C (2008) https://doi.org/10.1117/12.804260

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Inspection, Optical inspection, Scanners, Reflectivity, Wafer-level optics, Immersion lithography

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Proceedings Article | 30 October 2007 Paper

EUV mask substrate flatness improvement by laser irradiation

Kiwamu Takehisa, Jun Kodama, Haruhiko Kusunose

Proceedings Volume 6730, 67305I (2007) https://doi.org/10.1117/12.746537

KEYWORDS: Laser irradiation, Excimer lasers, Extreme ultraviolet, Quartz, Pulsed laser operation, Optical simulations, Extreme ultraviolet lithography, EUV optics, Polishing, Surface finishing

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Proceedings Article | 28 June 2005 Paper

Mask magnification of 8X will be also helpful for EUVL

Kiwamu Takehisa

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617278

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Scanners, Inspection, Extreme ultraviolet, Particles, Wafer-level optics, Double patterning technology, Mask making

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Proceedings Article | 6 December 2004 Paper

Proposal of using EUVL for PXL

Kiwamu Takehisa

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569651

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Electron beam lithography, Charged-particle lithography, Projection systems, Optical proximity correction, EUV optics, Mask making

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Proceedings Article | 5 July 2000 Paper

High-repetition-rate fluorine laser for microlithography

Junichi Fujimoto, Shinji Nagai, Koji Shio, Yasuaki Iwata, Kiwamu Takehisa, Toshihiro Nishisaka, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388997

KEYWORDS: Fluorine, Optical lithography, Excimer lasers, Laser development, Vacuum ultraviolet, Molecular lasers, Pulsed laser operation, Transmittance, Absorption, Solid state lasers

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