Dr. Koji Asakawa Profile

Dr. Koji Asakawa

at Kioxia Corp.

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Author

Publications (14)

Proceedings Article | 22 February 2021 Presentation + Paper

Preventing method of volume expansion of polymer after metal infiltration

Norikatsu Sasao, Shinobu Sugimura, Koji Asakawa

Proceedings Volume 11612, 1161209 (2021) https://doi.org/10.1117/12.2583782

KEYWORDS: Polymers, Polymethylmethacrylate, Metals, Polymer thin films, Aluminum, Oxides, Oxygen, FT-IR spectroscopy, Signal processing, Absorbance

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Proceedings Article | 28 March 2017 Presentation + Paper

Wide-range directed self-assembly lithography enabling wider range of applicable pattern size for both hexagonal multi-hole and line/space

Seiji Morita, Ryuichi Saito, Ryosuke Yamamoto, Norikatsu Sasao, Tomoaki Sawabe, Koji Asakawa, Shinobu Sugimura

Proceedings Volume 10144, 101440R (2017) https://doi.org/10.1117/12.2257987

KEYWORDS: Lithography, Dry etching, Immersion lithography, Annealing, Resistance, Double patterning technology, Molecular self-assembly, Optical lithography, Scanning electron microscopy, Organic materials, Directed self assembly, Semiconducting wafers, Reactive ion etching, Metals

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Proceedings Article | 26 March 2010 Paper

High resolution positive-working molecular resist attached with alicyclic acid-leaving group

Arisa Yamada, Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 7639, 76390S (2010) https://doi.org/10.1117/12.851392

KEYWORDS: Etching, Lithography, Molecules, Resistance, Scanning electron microscopy, Line width roughness, Oxygen, Quantum efficiency, Photoresist processing, Polymers

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Proceedings Article | 26 March 2008 Paper

Novel molecular resist based on an amorphous truxene derivative

Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi

Proceedings Volume 6923, 69230J (2008) https://doi.org/10.1117/12.770944

KEYWORDS: Molecules, Scanning electron microscopy, Silicon, Lithography, Electron beams, Line edge roughness, Thin films, Microscopes, Solids, Crystals

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Proceedings Article | 7 March 2007 Paper

Aluminum nanowire polarizing grids: fabrication and analysis

Vincent Pelletier, Koji Asakawa, Mingshaw Wu, Douglas Adamson, Richard Register, Paul Chaikin

Proceedings Volume 6462, 646217 (2007) https://doi.org/10.1117/12.698990

KEYWORDS: Metals, Aluminum, Dielectric polarization, Polarization, Ultraviolet radiation, Plasma, Dielectrics, Electrons, Polarizers, Nanowires

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Proceedings Article | 24 August 2001 Paper

193-nm single-layer resists based on advanced materials

Naomi Shida, Tohru Ushirogouchi, Koji Asakawa, Yoshinori Funaki, Akira Takaragi, Kiyoharu Tsutsumi, Keizo Inoue, Tatsuya Nakano

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436817

KEYWORDS: Polymers, Etching, Resistance, Dry etching, Lithography, Ultraviolet radiation, Reactive ion etching, Semiconducting wafers, Industrial chemicals, Light emitting diodes

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Proceedings Article | 23 June 2000 Paper

Advanced materials for 193-nm resists

Tohru Ushirogouchi, Koji Asakawa, Naomi Shida, Takeshi Okino, Satoshi Saito, Yoshinori Funaki, Akira Takaragi, Kentaro Tsutsumi, Tatsuya Nakano

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388279

KEYWORDS: Polymers, Etching, Chromatography, Resistance, Molecules, Dry etching, Computer simulations, Cobalt, Oxygen, Oxidation

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Proceedings Article | 11 June 1999 Paper

Chemically amplified resists using the absorption band shift method in conjunction with alicyclic compounds for ArF excimer laser lithography

Takeshi Okino, Koji Asakawa, Naomi Shida, Tohru Ushirogouchi

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350242

KEYWORDS: Polymers, Excimer lasers, Etching, Resistance, Lithography, Dry etching, Transparency, Absorption, Standards development, Silicon

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Proceedings Article | 29 June 1998 Paper

Chemically amplified ArF resists based on cleavable alicyclic group and the absorption band shift method

Naomi Shida, Takeshi Okino, Koji Asakawa, Tohru Ushirogouchi, Makoto Nakase

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312341

KEYWORDS: Absorption, Argon, Sodium, Spectroscopy, Silicon, Toxic industrial chemicals, Etching, Polymers, Solids, Dry etching

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Proceedings Article | 14 June 1996 Paper

Effect of substituent groups of phenol-derivative dissolution inhibitors on inhibition efficiency

Naoko Kihara, Satoshi Saito, Takuya Naito, Tohru Ushirogouchi, Koji Asakawa, Makoto Nakase

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241818

KEYWORDS: Polymers, Sodium, Molecules, Thermodynamics, Diffusion, Rutherfordium, Polymer thin films, Chromatography, Chemical reactions, Liquids

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Proceedings Article | 9 June 1995 Paper

Mechanism of amine additive in chemically amplified resist visualized by using Monte Carlo simulation

Tohru Ushirogouchi, Koji Asakawa, Makoto Nakase, Akinori Hongu

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210384

KEYWORDS: Molecules, Diffusion, Monte Carlo methods, Chemically amplified resists, Contamination, Edge roughness, Visualization, Photoresist processing, Systems modeling, Polymers

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Proceedings Article | 9 June 1995 Paper

Chemically ampilified ArF excimer laser resists using the absorption band shift method

Makoto Nakase, Takuya Naito, Koji Asakawa, Akinori Hongu, Naomi Shida, Tohru Ushirogouchi

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210355

KEYWORDS: Absorption, Excimer lasers, Polymers, Transparency, Optical transfer functions, Etching, Polymethylmethacrylate, Laser development, Resistance, Prototyping

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Proceedings Article | 9 June 1995 Paper

Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists

Koji Asakawa, Tohru Ushirogouchi, Makoto Nakase

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210361

KEYWORDS: Diffusion, Semiconducting wafers, Excimer lasers, Polymers, Silicon, Optical transfer functions, Silicon films, Absorption, Interfaces, Contamination

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Proceedings Article | 16 May 1994 Paper

Quantum chemical studies of chemically amplified resist materials for electron-beam and ArF excimer laser

Tohru Ushirogouchi, Naoko Kihara, Satoshi Saito, Takuya Naito, Koji Asakawa, Tsukasa Tada, Makoto Nakase

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175337

KEYWORDS: Absorption, Excimer lasers, Chemical analysis, Transparency, Electron beams, Chemically amplified resists, Molecules, Molybdenum, Polymers, Plasma etching

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Showing 5 of 14 publications

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