Dr. Kristopher A. Lavery Profile

Dr. Kristopher A. Lavery

Device Engineering Manager at Verily Life Sciences

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Author

Publications (4)

Proceedings Article | 15 April 2008 Paper

A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists

Shuhui Kang, Kristopher Lavery, Kwang-Woo Choi, Vivek Prabhu, Wen-Li Wu, Eric Lin, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018

KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

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Proceedings Article | 3 April 2008 Paper

Characterization of the latent image to developed image in model EUV photoresists

John Woodward, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036

KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

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Proceedings Article | 12 April 2007 Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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