In this paper we will study the influence of InGaN underlayer on efficiency of InGaN-based LEDs grown by plasma-assisted molecular beam epitaxy (PAMBE). We observed that LEDs with the thinnest underlayer have the highest efficiency. This finding agrees with the theory that the defects, which are buried in standard LEDs are in fact generated during the growth of GaN in MOVPE at high temperature. In case of PAMBE, the growth temperature of GaN is 300°C lower, and these defects are not generated in the first place and there is no need for an InGaN underlayer.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.