Test equipment for the development and mass production of micromirror array have been devised. Test equipment for the static and dynamic response of a single micromirror consists of HeNe laser, lenses, XY stage, CCD camera, position- sensitive photodiode and PC. It can be used to measure reflectance, tilt angle--input voltage relation, response time and resonant frequency, in the developing stage. It can also check the lifetime and uniformity of mirror quality over the wafer. Test equipment for the evaluation of micromirror array consists of CCD camera, lenses, XY stage, video signal processor and PC. It can classify the error- state of micromirror, generate statistical data and map of the position of abnormal micromirrors. The test results are shown on the monitor as a map that shows the error state, position and statistical data. It takes about 90 seconds to evaluate 50 X 50 micromirror array.
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